Impact of TID-induced threshold deviations in analog building-blocks of operational amplifiers

G. Cardoso, T. Balen, M. Lubaszewski, R. G. Vaz, O. Gonçalez
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引用次数: 2

Abstract

This paper presents an investigation on the performance of analog building-blocks of two counterpart architectures of Operational Amplifiers (with PMOS and NMOS differential amplifier as input stage) under cumulative radiation effects. This investigation is performed through Spice simulations, by injecting typical radiation-induced shifts in the threshold voltage of the transistors for the considered technology, a 0.5 µm standard CMOS process. Transient and DC (Direct Current) analysis are performed in differential and inverter stages of a simple two-stage operational amplifier. The linearity and voltage swing of both amplifier stages are evaluated, as well as, the effects on the bias current and the output offset voltage. Simulation results show that the NMOS differential amplifier architecture may have an improved robustness in radiation environments, if compared to its PMOS counterpart, when considering the typical behavior of MOS transistors under radiation.
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在运算放大器的模拟构件中tid诱导的阈值偏差的影响
本文研究了两种运算放大器(PMOS和NMOS差分放大器作为输入级)在累积辐射效应下的模拟构件性能。本研究通过Spice模拟进行,通过在所考虑的技术(0.5 μ m标准CMOS工艺)的晶体管阈值电压中注入典型的辐射诱发位移。对一个简单的两级运算放大器的差动级和逆变级进行了瞬态和直流分析。评估了两个放大器级的线性度和电压摆幅,以及对偏置电流和输出偏置电压的影响。仿真结果表明,考虑到MOS晶体管在辐射环境下的典型行为,与PMOS相比,NMOS差分放大器结构在辐射环境下具有更好的鲁棒性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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