Photon emission from 70 nm gate length MOSFETs

H. Kurino, H. Hashimoto, Y. Hiruma, T. Fujimori, M. Koyanagi
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引用次数: 5

Abstract

The photon emission from extremely small size MOSFETs with L/sub G/=70 nm is observed for the first time. It is found that the electron temperature of the hot electrons monotonously increases while the substrate current to drain current ratio which is related to the avalanche multiplication factor initially increases and then decreases due to the latch effect caused by the parasitic bipolar transistor action as the gate length is reduced from 500 nm to 70 nm. The number of photons emitted with a higher energy has more intimate relation with the charge pumping current change caused by the hot-carrier generated interface states. It is shown that the photon emission is more effective for evaluating the hot carrier phenomenon than the substrate current when the gate length is smaller and the drain voltage is higher.<>
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70 nm栅长mosfet的光子发射
首次观测到L/sub G/=70 nm的极小尺寸mosfet的光子发射。结果表明,当栅极长度从500 nm减小到70 nm时,热电子的电子温度单调升高,而与雪崩倍增因子有关的衬底电流与漏极电流比由于寄生双极晶体管的锁存效应先升高后降低。高能量发射的光子数与热载子产生的界面态引起的电荷抽运电流变化关系更为密切。结果表明,当栅极长度较小时,漏极电压较高时,光子发射比衬底电流更能有效地评价热载子现象。
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