Jinbao Wei, Haigang Yang, Hongguang Sun, Z. Lin, S. Xia
{"title":"A fully CMOS-integrated pH-ISFET interface circuit","authors":"Jinbao Wei, Haigang Yang, Hongguang Sun, Z. Lin, S. Xia","doi":"10.1109/ICASIC.2005.1611338","DOIUrl":null,"url":null,"abstract":"ISFET is a potentiometric sensor that is easily adapted for a wide range of chemical, biochemical and biomedical measurements. This article presents an ISFET sensor system-on-chip including the ISFET/REFET (reference FET) pair and ISFET/REFET amplifiers, bias current generator, as well as a reference electrode structure, all integrated on the same chip based on CMOS technology. The sensor chip is fabricated in a standard 0.35/spl mu/m 4-metal and 2-poly layer CMOS process (chartered semiconductor) to which extra post processing steps are added for depositing membranes. The chip operates at 3.3V and the total die area is 5 mm. Finally the performance of the integrated sensor interface circuit is measured and analyzed.","PeriodicalId":431034,"journal":{"name":"2005 6th International Conference on ASIC","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2005-10-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2005 6th International Conference on ASIC","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICASIC.2005.1611338","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
ISFET is a potentiometric sensor that is easily adapted for a wide range of chemical, biochemical and biomedical measurements. This article presents an ISFET sensor system-on-chip including the ISFET/REFET (reference FET) pair and ISFET/REFET amplifiers, bias current generator, as well as a reference electrode structure, all integrated on the same chip based on CMOS technology. The sensor chip is fabricated in a standard 0.35/spl mu/m 4-metal and 2-poly layer CMOS process (chartered semiconductor) to which extra post processing steps are added for depositing membranes. The chip operates at 3.3V and the total die area is 5 mm. Finally the performance of the integrated sensor interface circuit is measured and analyzed.