Sub-pixel Edge Detection in Diameter Measurement for Single Silicon Crystal

Senwei Xiang, Weimin Yang, Ting Wang
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Abstract

Edge detection plays an important role in diameter measurement for single silicon crystal. However, the high-temperature production process (about 1,450 °C) emits intense infrared and visible lights that will blur the edge and hinder the accurate calculation for the diameter of the crystal ingot. In this paper, the aura phenomenon caused by high-temperature radiation is deliberated and the Sigmoid function is discovered to best fit the luminance distribution along the normal direction of the edge. Thus, a sub-pixel edge detection method based on Sigmoid fitting is proposed for high-temperature objects, such as the single silicon crystal. The method first extracts the coarse edge of the object, then the luminance distribution on the normal direction of the coarse edge is fitted to the Sigmoid function. Mathematical analysis points out the location of the precise sub-pixel edge is closely related to the parameters of the fitted Sigmoid function. Real-world experiments of applying our proposed method and other different methods in the measurement system are performed. Comparison results prove superiority of our proposed method in accuracy and robustness.
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单晶直径测量中的亚像素边缘检测
边缘检测在单晶直径测量中起着重要的作用。然而,高温生产过程(约1450°C)会发出强烈的红外线和可见光,这会模糊边缘并妨碍对晶锭直径的准确计算。本文研究了高温辐射引起的光环现象,发现Sigmoid函数最能拟合沿边缘法线方向的亮度分布。针对单晶硅等高温物体,提出了一种基于Sigmoid拟合的亚像素边缘检测方法。该方法首先提取目标的粗边缘,然后将粗边缘法线方向上的亮度分布拟合到Sigmoid函数中。数学分析指出,精确亚像素边缘的位置与拟合的Sigmoid函数的参数密切相关。将本文提出的方法和其他不同的测量方法应用于测量系统进行了实际实验。对比结果证明了该方法在精度和鲁棒性方面的优越性。
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