Structuring of grating arrays in multilayered foil by excimer laser

P. Leech, L. McCarthy, P. Osvath
{"title":"Structuring of grating arrays in multilayered foil by excimer laser","authors":"P. Leech, L. McCarthy, P. Osvath","doi":"10.1109/ICONN.2008.4639280","DOIUrl":null,"url":null,"abstract":"We describe the patterning of multilayered foil by irradiation with excimer laser. The foil consisted of an upper layer of lacquer/ intermediate layers of polymer and Al/ a base layer of low melting point resin. Ablation of the foil was characterised by a sequential removal of the layers in the structure. A critical level of fluence and number of pulses was required to ablate each of the additional layers. Four threshold levels of damage have been identified as i) damage to the upper lacquer layer without removal, ii) the removal of the lacquer layer, iii) the removal of the intermediate layers and iv) the removal of all layers. Measurements of the ablation depth for a single pulse have shown a logarithmic dependence on laser fluence within the upper and intermediate layers.","PeriodicalId":192889,"journal":{"name":"2008 International Conference on Nanoscience and Nanotechnology","volume":"53 2","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 International Conference on Nanoscience and Nanotechnology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICONN.2008.4639280","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

We describe the patterning of multilayered foil by irradiation with excimer laser. The foil consisted of an upper layer of lacquer/ intermediate layers of polymer and Al/ a base layer of low melting point resin. Ablation of the foil was characterised by a sequential removal of the layers in the structure. A critical level of fluence and number of pulses was required to ablate each of the additional layers. Four threshold levels of damage have been identified as i) damage to the upper lacquer layer without removal, ii) the removal of the lacquer layer, iii) the removal of the intermediate layers and iv) the removal of all layers. Measurements of the ablation depth for a single pulse have shown a logarithmic dependence on laser fluence within the upper and intermediate layers.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
准分子激光在多层箔中构造光栅阵列
描述了准分子激光辐照多层箔的图案化过程。铝箔由上层漆/中间层聚合物和Al/底层低熔点树脂组成。烧蚀箔的特点是连续去除结构中的层。要烧蚀每一附加层,需要达到临界的流量和脉冲数。已经确定了四个阈值级别的损坏:i)上层漆层损坏而不移除,ii)漆层移除,iii)中间层移除,iv)所有层都移除。单脉冲烧蚀深度的测量显示了对上层和中间层内激光能量的对数依赖关系。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Modification of the density of crystallites in silicon nano-crystalline thin films by substrate profiling Organic fluorophores doped nanoparticles for thin film sensors Fabrication and characterization of hybrid DBPPV-CdSe/ZnS quantum dot light-emitting diodes Cavity enhancement of a Nitrogen-Vacancy-based single photon source UV-induced wettability change of teflon-modified ZnO nanorod arrays on LiNbO3 substrate
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1