Gradual Degradation of GaAs FETs Under Normal Operation

M. Millea
{"title":"Gradual Degradation of GaAs FETs Under Normal Operation","authors":"M. Millea","doi":"10.1109/IRPS.1986.362122","DOIUrl":null,"url":null,"abstract":"The gradual degradation of low-noise and power GaAs FETs under normal operating conditions has been investigated. The degradation of the drain current under both low and normal biasing was monitored for low-noise devices, but only the degradation of the drain resistance was monitored for power GaAs FETs. Using elevated temperatures to stabilize devices and assuming a single monotonically decreasing failure mode, it is relatively simple to determine the device's long-term reliability within several days of operating at normal temperatures of 100°C or lower. This is accomplished by observing a sufficiently low degradation rate, which, when extrapolated to the desired end-of-life, yields an acceptable low longterm degradation estimation. To minimize the risk associated with the possible existence of compensating gradual degradation modes, the gradual degradation of devices is examined against a second gradual degradation failure criterion, which is based on the device having a sufficient low-degradation second derivative. Fulfilling the second-order failure criterion is more difficult to demonstrate and is the main focus of this investigation.","PeriodicalId":354436,"journal":{"name":"24th International Reliability Physics Symposium","volume":"34 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1986-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"24th International Reliability Physics Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS.1986.362122","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

The gradual degradation of low-noise and power GaAs FETs under normal operating conditions has been investigated. The degradation of the drain current under both low and normal biasing was monitored for low-noise devices, but only the degradation of the drain resistance was monitored for power GaAs FETs. Using elevated temperatures to stabilize devices and assuming a single monotonically decreasing failure mode, it is relatively simple to determine the device's long-term reliability within several days of operating at normal temperatures of 100°C or lower. This is accomplished by observing a sufficiently low degradation rate, which, when extrapolated to the desired end-of-life, yields an acceptable low longterm degradation estimation. To minimize the risk associated with the possible existence of compensating gradual degradation modes, the gradual degradation of devices is examined against a second gradual degradation failure criterion, which is based on the device having a sufficient low-degradation second derivative. Fulfilling the second-order failure criterion is more difficult to demonstrate and is the main focus of this investigation.
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正常工作下GaAs场效应管的逐渐退化
研究了低噪声和功率GaAs场效应管在正常工作条件下的逐渐退化。低噪声器件监测了低偏置和正常偏置下漏极电流的衰减,而功率GaAs fet只监测了漏极电阻的衰减。在100℃或更低的正常温度下,使用高温来稳定设备,并假设单一的单调递减的故障模式,在几天内确定设备的长期可靠性相对简单。这是通过观察一个足够低的降解率来实现的,当外推到期望的寿命结束时,产生一个可接受的低长期降解估计。为了最小化与可能存在的补偿逐渐退化模式相关的风险,根据第二个逐渐退化失效准则检查设备的逐渐退化,该准则基于设备具有足够的低退化二阶导数。满足二阶破坏准则是较难证明的,也是本研究的重点。
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