Field enhancement in polymer waveguides fabricated by UV imprinting

P. Karioja, M. Hiltunen, J. Hiltunen, J. Tuominen, Meng Wang, R. Myllyla, S. Pearce, M. Charlton
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Abstract

Polymers are applicable materials for photonic device fabrication due to their good optical properties and versatile processability at low temperatures, and therefore, provide possibility for low-cost fabrication. For waveguide device fabrication, the most critical requirement is the selection of the patterning method for the ridge that is bounding the optical mode in the waveguide. In this paper, we review our UV-imprinting achievements for fabricating polymer-based single-mode waveguides: ridge, inverted ridge and layered composite waveguides. In addition, we show simulation results for polymer-based slot waveguides. The ridge waveguide consists of a strip waveguide core superimposed onto a slab waveguide made of the core material. When patterning a ridge by imprinting technique, a residual layer is formed underneath the imprinted ridges. The residual layer might cause propagation loss due to power leakage into the slab guide, and therefore, a subsequent etching step is required. In the inverted ridge waveguide configuration, a groove of cladding material is patterned by imprinting, and followed by the filling of the groove with the core material. From the imprint fabrication point of view, the fabrication tolerances can be relaxed due to the fact that the residual slab layer underneath the waveguide can have arbitrary thickness. Besides fabrication of above mentioned waveguide structures, we review the possibility to fabricate composite waveguide devices by depositing inorganic thin films with high-refractive index on UV-imprinted polymeric structures with low-refractive index. The aim to use composite structures is to manipulate the optical field distribution in the waveguides and to enhance the interaction of the optical field with the surface, which is desirable especially in waveguide sensor applications. The polymer-based slot waveguide, which is analyzed theoretically, is an ultimate approach for optical field enhancement.
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UV印迹聚合物波导的场增强
聚合物由于其良好的光学特性和低温下的通用可加工性而成为光子器件制造的适用材料,因此为低成本制造提供了可能。对于波导器件的制造,最关键的要求是选择在波导中包围光模式的脊的图像化方法。本文综述了紫外光印迹技术在制备聚合物单模波导:脊波导、倒脊波导和层状复合波导方面的研究进展。此外,我们还展示了基于聚合物的槽波导的仿真结果。脊状波导由叠加在由该波导材料制成的板状波导上的条形波导芯组成。当用压印技术对脊进行图案化时,在压印脊的下面会形成一层残余层。由于功率泄漏到板波导中,残留层可能导致传播损耗,因此需要后续的蚀刻步骤。在倒脊波导结构中,通过压印绘制包层材料的凹槽,然后用芯材料填充凹槽。从压印制造的角度来看,由于波导下方的残余板层可以具有任意厚度,因此制造公差可以放宽。除了上述波导结构的制备外,我们还回顾了在低折射率的uv印迹聚合物结构上沉积高折射率无机薄膜制备复合波导器件的可能性。使用复合结构的目的是控制光场在波导中的分布,并增强光场与表面的相互作用,这在波导传感器应用中是可取的。从理论上分析了聚合物基缝隙波导是光场增强的最终途径。
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