{"title":"Observation of Influence of Electrical Isolation of Dielectric Substrates on Structure and Reflectivity of Mo/Si Multilayer Coatings","authors":"G. Gutman, Richard A. Watts","doi":"10.1364/sxray.1992.pd7","DOIUrl":null,"url":null,"abstract":"One of the most important general reguirements for soft X-ray optics, and X-ray lithography in particular, is high reflectivity at normal incidence for long wavelength X-rays. Dependence of the multilayer structure on the deposition parameters and identification of appropriate conditions for the growth of multilayers having optimally smooth and sharp interfaces has been reported elsewhere1,2,3,4.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"25 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1992.pd7","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract
One of the most important general reguirements for soft X-ray optics, and X-ray lithography in particular, is high reflectivity at normal incidence for long wavelength X-rays. Dependence of the multilayer structure on the deposition parameters and identification of appropriate conditions for the growth of multilayers having optimally smooth and sharp interfaces has been reported elsewhere1,2,3,4.
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