Electrical modeling and analysis of polymer-cavity through-silicon vias

Xiaoxian Liu, Zhangming Zhu, Yintang Yang, Qijun Lu, Xiangkun Yin, Yang Liu
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Abstract

The polymer-cavity through-silicon vias (TSVs) on low resistivity silicon (LRSi) are proposed in this letter to reduce the conductive substrate losses for microwave applications, due to that the coupling loss of conventional LRSi is considerable in high speed three-dimensional integrated circuits (3-D ICs). The accurate wideband equivalent circuit model and simplified π-model are derived based on the physical design parameters, which are established by the ADS software. Well agreements between the proposed models and 3D full-wave EM field simulation of Ansoft's HFSS are shown with the operating frequencies up to 20 GHz.
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硅通孔聚合物腔的电学建模与分析
由于传统LRSi在高速三维集成电路(3-D ic)中的耦合损耗相当大,本文提出了低电阻硅(LRSi)上的聚合物腔通硅孔(tsv),以减少微波应用中的导电衬底损耗。基于物理设计参数,利用ADS软件建立了精确的宽带等效电路模型和简化π-模型。在工作频率高达20 GHz的情况下,所提出的模型与Ansoft公司HFSS的三维全波电磁场仿真结果吻合良好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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