{"title":"An Asymmetric Metal Electrode for TFT-LCDs","authors":"Yue Wu, Weina Yong, Chia-Yu. Lee, Hang Zhou","doi":"10.1109/CAD-TFT.2018.8608114","DOIUrl":null,"url":null,"abstract":"In this paper, an asymmetric metal electrode with MoTi/Cu/Mo structure was designed. Due to the appropriate anticorrosion behavior, the thin MoTi top layer prevented photoresist peeling off during the whole etch process, resulted a superior etch profile compare to the control group with a Mo/Cu/Mo symmetrical structure.","PeriodicalId":146962,"journal":{"name":"2018 9th Inthernational Conference on Computer Aided Design for Thin-Film Transistors (CAD-TFT)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 9th Inthernational Conference on Computer Aided Design for Thin-Film Transistors (CAD-TFT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CAD-TFT.2018.8608114","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract
In this paper, an asymmetric metal electrode with MoTi/Cu/Mo structure was designed. Due to the appropriate anticorrosion behavior, the thin MoTi top layer prevented photoresist peeling off during the whole etch process, resulted a superior etch profile compare to the control group with a Mo/Cu/Mo symmetrical structure.
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