Design of 100nm Single-Electron Transistor (SET) by 2D TCAD Simulation

A. Rasmi, U. Hashim, A. Awang Mat
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引用次数: 2

Abstract

One of the great problems in current large-scale integrated circuits (LSIs) is increasing power dissipation in a small silicon chip. Single-electron transistor (SET) which operate by means of one-by-one electron transfer, small size and consume very low power are suitable for achieving higher levels of integration. In this paper, SET is designed with 100 nm gate length and 10 nm gate width is successfully simulated by Synopsys TCAD. The power of SET device that obtained from simulation is 3.771 times 10-9 Watt for fixed current and 3.3565 times 10-9 Watt if fixed the gate voltage, VG, and the capacitance of this device is 0.4297 aF. These results were achieved at room temperature operation.
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基于二维TCAD仿真的100nm单电子晶体管设计
当前大规模集成电路(lsi)面临的一大问题是在小硅片上增加功耗。单电子晶体管(SET)是一种以单电子传递方式工作的器件,体积小,功耗低,适合实现更高的集成度。本文设计了栅极长度为100nm,栅极宽度为10nm的SET,并通过Synopsys TCAD对其进行了仿真。通过仿真得到的SET器件在固定电流下的功率为3.771 × 10-9瓦特,在固定栅电压VG下的功率为3.3565 × 10-9瓦特,该器件的电容为0.4297 aF。这些结果都是在室温下工作得到的。
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