Non-local effects in graphene plasmonic devices operating at short wavelength infrared frequencies

Joel. F. Siegel, Jonathan H. Dwyer, P. Gopalan, V. Brar
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Abstract

Plasmons in graphene are known to be tunable and to exhibit extreme field confinement, making them useful for optoelectronic devices, and for exploring extreme light matter interactions. Thus far, these effects have been demonstrated at Thz to mid-IR frequencies, with the upper frequency limit set by limits of electron beam lithography, which can make graphene nanostructures as small as 15nm. In this talk, I will show that bottom-up block co-polymer lithography methods can create nanostructures with characteristic lengthscales as small as 12nm, and that in this regime the non-local interactions in graphene become strong, creating a significant blue shift of the plasmonic resonances. This allows for the creation of plasmonic cavities with resonances at wavelengths as short as 2.2um. The confinement factors of these cavities reach 135, which is exceedingly large, but less than what has been predicted by theory.
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在短波长红外频率下工作的石墨烯等离子体器件中的非局部效应
众所周知,石墨烯中的等离子体是可调谐的,并表现出极端的场约束,这使得它们对光电器件和探索极端光物质相互作用非常有用。到目前为止,这些效应已经在太赫兹到中红外频率上得到了证明,其频率上限由电子束光刻技术的极限设定,电子束光刻技术可以使石墨烯纳米结构小至15nm。在这次演讲中,我将展示自下而上的嵌段共聚物光刻方法可以创造出特征长度小至12nm的纳米结构,并且在这种情况下石墨烯中的非局部相互作用变得很强,产生了等离子体共振的显著蓝移。这样就可以产生波长短至2.2微米的共振等离子体腔。这些空腔的约束因子达到135,这是非常大的,但比理论预测的要小。
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