Mosfet Submicron Model For Temperature Effect Characterization

H. Masuda, R. Ikematsu, J. Mano, H. Sugihara
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Abstract

This paper presents a new circuit model for sub-um NMOSFETs and describes experiments on them. The model is focused on the temperature effect on I-V and CV characteristics. The resulting I-V modeling error (RMS: Root Mean Square) is verified to be less than 1.5% for Vd=O-SV and Vg=O-SV operating conditions, and 300-450K temperature range. The CV model error also examined, showing 6.0% at 400K. Drain current characteristics were measured with a 0.8um NMOS under various temperature conditions. Through experiments and parameter extraction (for MOSTSM model[ 1][2]) on the measured I-V data, the following results are noted (see Fig. 1). (1) Channel conductance of a unit area (Po) exhibits a significant decrease (one half) for the temperature rise from 300K to 450K. However, the corresponding drain current reduction is only 20% at Vds=Vgs=SV. (2) The above effect is caused by a change in the gate-field effect factor of channelconductance (eel ), which shows a monotonic decrease for rising temperature [4]. MOST temperature model
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温度效应表征的Mosfet亚微米模型
本文提出了一种新的亚微米nmosfet电路模型,并对其进行了实验。该模型的重点是温度对I-V和CV特性的影响。在Vd=O-SV和Vg=O-SV工况下,以及300-450K温度范围内,由此产生的I-V建模误差(RMS:均方根)小于1.5%。还检查了CV模型误差,在400K时显示6.0%。用0.8um NMOS测量了不同温度条件下的漏极电流特性。通过对实测I-V数据进行实验和参数提取(对于MOSTSM模型[1][2]),得到如下结果(见图1):(1)从300K到450K温度升高,单位面积沟道电导(Po)显著减小(一半)。然而,在Vds=Vgs=SV时,相应的漏极电流减少仅为20%。(2)上述效应是由通道电导门场效应因子(eel)的变化引起的,随着温度的升高,通道电导门场效应因子呈单调下降趋势。MOST温度模型
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