Detection and Characterization of Single Near-Interface Oxide Traps with the Charge Pumping Method

T. Tsuchiya, M. Hori, Y. Ono
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Abstract

We carried out detection and characterization of single Si/SiO2near-interface oxide-traps (NIOTs) using the systematic measurements procedure by the high-resolution charge pumping (CP) method we developed, and we found a single NIOT where CP current depends upon both fall and rise times of the CP gate pulse. This demonstrates that individual Si/SiO2NIOTs have two energy levels, one in the upper part, the other in the lower part of the silicon bandgap. The results may suggest that the NIOTs also have an amphoteric nature, i.e., have both donor-like one-electron, and acceptor-like two-electrons states, similar to the Si/SiO2interface traps.
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电荷泵送法检测和表征单近界面氧化物陷阱
我们利用我们开发的高分辨率电荷泵浦(CP)方法的系统测量程序对单个Si/ sio2近界面氧化陷阱(NIOT)进行了检测和表征,我们发现单个NIOT的CP电流取决于CP门脉冲的下降和上升时间。这表明单个Si/ sio2niot具有两个能级,一个在硅带隙的上部,另一个在硅带隙的下部。结果表明,niot也具有两性性质,即具有类似于Si/ sio2界面陷阱的类供体单电子态和类受体双电子态。
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