Vdd gate biasing RF CMOS amplifier design technique based on the effect of carrier velocity saturation

N. Ishihara
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引用次数: 2

Abstract

RF CMOS amplifier design technique using the carrier velocity saturation region on the drain current of the MOS transistor aggressively has been proposed. By setting the transistor gate bias to the power supply voltage (Vdd), stable operation against Vdd variations can be achieved with a simple circuit configuration. By using the technique, a 5 GHz amplifier has been designed and fabricated by using 0.18-μm CMOS process technology. The chip has been operated with a gain variation less than 1 dB having a peak gain of 13.5 dB when Vdd has been changed from 1.2 to 2.9 V. Input and output matching variations are 1 dB and 3 dB with minimum values of ™10.2 dB and ™ 11.5 dB respectively.
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基于载流子速度饱和效应的Vdd门偏置射频CMOS放大器设计技术
提出了利用MOS晶体管漏极电流的载流子速度饱和区进行射频CMOS放大器设计的技术。通过将晶体管栅极偏置设置为电源电压(Vdd),可以通过简单的电路配置实现对Vdd变化的稳定运行。利用该技术,设计并制作了一个采用0.18 μm CMOS工艺的5 GHz放大器。当Vdd从1.2 V变为2.9 V时,芯片的增益变化小于1 dB,峰值增益为13.5 dB。输入和输出匹配变化为1 dB和3 dB,最小值分别为10.2 dB和11.5 dB。
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