{"title":"Single-substrate Microfluidic Systems on PET Film for mm-Wave Sensors","authors":"Mario Mueh, P. Hinz, C. Damm","doi":"10.1109/IMBIoC47321.2020.9385043","DOIUrl":null,"url":null,"abstract":"A complementary approach to the fabrication of microfluidic systems is presented with the aim of reducing attenuation of resonator-based sensors in proximity of aqueous media. Contrary to state-of-the-art techniques, the channel system is dry-etched into a PET film, which also carries a functional RF metalization forming an array of split-ring resonators. This technique is easy to implement in standard micro-lithography and provides high flexibility in placement of the electrodes. Verified process parameters for etching depths up to $\\boldsymbol{13.5\\mu \\mathrm{m}}$. are presented together with a functional concept validation, comparing fullwave simulation results to a prototype device.","PeriodicalId":297049,"journal":{"name":"2020 IEEE MTT-S International Microwave Biomedical Conference (IMBioC)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE MTT-S International Microwave Biomedical Conference (IMBioC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMBIoC47321.2020.9385043","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
A complementary approach to the fabrication of microfluidic systems is presented with the aim of reducing attenuation of resonator-based sensors in proximity of aqueous media. Contrary to state-of-the-art techniques, the channel system is dry-etched into a PET film, which also carries a functional RF metalization forming an array of split-ring resonators. This technique is easy to implement in standard micro-lithography and provides high flexibility in placement of the electrodes. Verified process parameters for etching depths up to $\boldsymbol{13.5\mu \mathrm{m}}$. are presented together with a functional concept validation, comparing fullwave simulation results to a prototype device.