Effect of channel width-to-length ratio on isothermal point of MOSFET-ISFET structure

Nurul Izzati Mohammad Noh, K. A. Yusof, M. Zolkapli, A. Abdullah, W. Abdullah, S. H. Herman
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引用次数: 1

Abstract

The effect of channel width-to-length (W/L) ratio on MOSFET-ISFET structures was investigated from simulation and experimental approach. A metal-oxide-semiconductor field-effect-transistor (MOSFET) has been adopted to investigate the isothermal point of an ion-sensitive FET (ISFET), which is needed to suit the readout interfacing circuit of an ISFET sensor. The MOSFET structure with different W/L ratio has been characterized in order to see the effect of W/L ratio to the isothermal point. The Keithley 236 Parameter Analyzer and Semi-auto prober micromanipulator system were used to measure the drain-source current (IDS) versus gate to source voltage (VGS) curves at various temperatures from 30 °C to 60 °C. The simulation result showed that the reduction of W/L ratio can decrease the isothermal point and this was proven by the actual measurement.
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沟道宽度与长度比对MOSFET-ISFET结构等温点的影响
从仿真和实验两方面研究了沟道宽长比对MOSFET-ISFET结构的影响。采用金属氧化物半导体场效应晶体管(MOSFET)对离子敏感场效应管(ISFET)的等温点进行了研究,以适应离子敏感场效应管传感器读出接口电路的需要。为了观察W/L比对等温点的影响,对不同W/L比的MOSFET结构进行了表征。采用Keithley 236参数分析仪和半自动探针微操作系统测量了30 ~ 60℃不同温度下的漏源电流(IDS)与栅源电压(VGS)曲线。仿真结果表明,降低W/L比可以降低等温点,并通过实际测量得到了验证。
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