{"title":"Real-time process monitoring [semiconductor manufacturing line]","authors":"R. Bunkofske, N. T. Pascoe, J. Colt, M. W. Smit","doi":"10.1109/ASMC.1996.558090","DOIUrl":null,"url":null,"abstract":"This paper discusses the building, installation and integration of a data acquisition and analysis system in a semiconductor manufacturing line known as the real time process monitoring system (RTPM). It describes how it has been integrated with the site logistics system, the statistical process control system, and the characterization data base to provide improved process control, increased tool availability, and enhanced yield learning.","PeriodicalId":325204,"journal":{"name":"IEEE/SEMI 1996 Advanced Semiconductor Manufacturing Conference and Workshop. Theme-Innovative Approaches to Growth in the Semiconductor Industry. ASMC 96 Proceedings","volume":"596 ","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-11-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE/SEMI 1996 Advanced Semiconductor Manufacturing Conference and Workshop. Theme-Innovative Approaches to Growth in the Semiconductor Industry. ASMC 96 Proceedings","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASMC.1996.558090","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
This paper discusses the building, installation and integration of a data acquisition and analysis system in a semiconductor manufacturing line known as the real time process monitoring system (RTPM). It describes how it has been integrated with the site logistics system, the statistical process control system, and the characterization data base to provide improved process control, increased tool availability, and enhanced yield learning.
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