Multilayer Damage and Repair Issues in Soft-X-Ray Projection Lithography

D. Gaines, R. Spitzer, N. Ceglio
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Abstract

Current soft x-ray projection lithography (SXPL) system designs require multilayer coated optics to operate at levels approaching predicted maximums for near normal incidence reflectivity. Effects that (potentially) degrade multilayer performance in the SXPL environment are discussed. Appropriate repair strategies are suggested, and preliminary results are presented.
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软x射线投影光刻中的多层损伤与修复问题
当前的软x射线投影光刻(SXPL)系统设计要求多层涂层光学元件在接近接近正入射反射率的预测最大值的水平上工作。讨论了在SXPL环境中(潜在地)降低多层性能的影响。提出了相应的修复策略,并给出了初步结果。
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