System for extensive characterization of MOS and SOI MOS structures by means of charge pumping

S. Szostak, L. Lukasiak, A. Jakubowski
{"title":"System for extensive characterization of MOS and SOI MOS structures by means of charge pumping","authors":"S. Szostak, L. Lukasiak, A. Jakubowski","doi":"10.1109/ICCDCS.2002.1004090","DOIUrl":null,"url":null,"abstract":"The performance of MOS devices is to a large extent determined by the quality of the Si-SiO/sub 2/ interface. This paper presents a new system for characterization of MOS and MOS SOI structures by means of charge pumping. MOSFETs and SOI MOSFETs are used as test structures.","PeriodicalId":416680,"journal":{"name":"Proceedings of the Fourth IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.02TH8611)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-08-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the Fourth IEEE International Caracas Conference on Devices, Circuits and Systems (Cat. No.02TH8611)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICCDCS.2002.1004090","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

The performance of MOS devices is to a large extent determined by the quality of the Si-SiO/sub 2/ interface. This paper presents a new system for characterization of MOS and MOS SOI structures by means of charge pumping. MOSFETs and SOI MOSFETs are used as test structures.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
系统广泛表征MOS和SOI MOS结构的手段,电荷泵
MOS器件的性能在很大程度上取决于Si-SiO/sub - 2/接口的质量。本文提出了一种用电荷泵送的方法表征MOS和MOS SOI结构的新系统。mosfet和SOI mosfet用作测试结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Effects of positive gate bias stressing and subsequent recovery treatment in power VDMOSFETs Next Generation Lab-a solution for remote characterization of analog integrated circuits PL and CL emissions in thermal oxide and silicon rich oxide films implanted with silicon Optimum design of device/circuit cooperative schemes for ultra-low power applications Fully integrated programmable Howland current source for sensors excitation
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1