{"title":"Resist Characterization and Lithography Simulation","authors":"A. Neureuther, W. Oldham","doi":"10.1364/sxray.1991.thd1","DOIUrl":null,"url":null,"abstract":"The properties of important high-resolution resist systems will be briefly reviewed. Techniques for resist characterization will be discussed including experimental techniques, models for exposure (latent image formation), modifications of the latent image including diffusion and amplification, and development.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"49 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1991.thd1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
The properties of important high-resolution resist systems will be briefly reviewed. Techniques for resist characterization will be discussed including experimental techniques, models for exposure (latent image formation), modifications of the latent image including diffusion and amplification, and development.
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