{"title":"The future of semiconductors; Moore or less","authors":"H. Veendrick","doi":"10.1109/TUTCAS.2001.946983","DOIUrl":null,"url":null,"abstract":"Scaling results in: increasing design productivity gap; increasing mask costs; increasing leakage currents; increasing noise while noise margins reduce; increasing test costs; increasing technology costs due to approaching the limits. Design measures to limit leakage and noise and to support testing and debug, require an increasing number of transistors (up to 20-40%) and more complex processes to support embedded options. The move to the next technology will become less and less commercially attractive.","PeriodicalId":376181,"journal":{"name":"Tutorial Guide. ISCAS 2001. IEEE International Symposium on Circuits and Systems (Cat. No.01TH8573)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-05-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Tutorial Guide. ISCAS 2001. IEEE International Symposium on Circuits and Systems (Cat. No.01TH8573)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/TUTCAS.2001.946983","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Scaling results in: increasing design productivity gap; increasing mask costs; increasing leakage currents; increasing noise while noise margins reduce; increasing test costs; increasing technology costs due to approaching the limits. Design measures to limit leakage and noise and to support testing and debug, require an increasing number of transistors (up to 20-40%) and more complex processes to support embedded options. The move to the next technology will become less and less commercially attractive.