Amplification of femtosecond pulses at 126 nm in optical field-induced plasma filamentation in Ar

S. Kubodera, Kazuyuki Fujiyoshi, M. Kaku, M. Katto
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Abstract

We have observed an optical gain at the wavelength of 126 nm in an Ar excimer (Ar2 *) amplifier by utilizing a femtosecond vacuum ultraviolet (VUV) seed beam tuned at 126 nm. The maximum optical gain value of 1.1 cm-1 with a spatial distribution in the optical-field-induced ionization (OFI) Ar plasma was observed. The plasma diagnosis revealed that the plasma contraction near the plasma amplifier axis together with the plasma expansion was a key issue to observe such a high optical gain value inside the Ar plasma filament. The center axis of the contracted plasma amplifier showed the high electron density more than 1018 cm-3 even after 100 ns from the plasma production of Ar at 1 MPa. Our OFI plasma/excimer kinetics code reproduced the temporal progress of the optical gain distribution as well as the maximum gain value.
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光场诱导等离子体成丝中126 nm飞秒脉冲的放大
利用飞秒真空紫外(VUV)种子束在126nm调谐,在Ar准分子(Ar2 *)放大器中观察到波长为126nm的光学增益。在光场诱导电离氩等离子体中,最大光学增益值为1.1 cm-1,且具有一定的空间分布。等离子体诊断结果表明,等离子体在等离子体放大器轴附近的收缩与等离子体的膨胀是在氩等离子体灯丝内部观测到如此高的光增益值的关键。收缩等离子体放大器的中心轴在1mpa氩等离子体产生100 ns后仍显示出超过1018 cm-3的高电子密度。我们的OFI等离子体/准分子动力学代码再现了光学增益分布的时间进展以及最大增益值。
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