Three-Dimensional Architecture of Sulfur Doped Graphene for Supercapacitor

IF 0.6 4区 工程技术 Q4 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Nanoelectronics and Optoelectronics Pub Date : 2023-06-01 DOI:10.1166/jno.2023.3442
Changwang Li, Xu Wang, Gengzheng Liu, Zefei Guo, Bowang Zhao, Jiayu Liang, Ahmad Umar, Huilian Hao, Wenyao Li
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引用次数: 2

Abstract

The introduction of heteroatoms is beneficial to prevent the stacking of graphene and enhance the electrochemical performance of graphene-based electrode materials. In this work, the three-dimensional structure sulfur-doped graphene (SG) electrode materials were prepared by using PEDOT:PSS as sulfur source, which can form a polymer chain on the surface of the graphene oxide, thus the sulfur atoms can be successfully doped into the graphene lattice by annealing treatment. The obtained SG electrode material exhibits a high specific capacitance of 254 F g −1 at 0.5 A g −1 , which is significantly better than that of the pure reduced graphene oxide. The significant increase in specific capacitance confirms that sulfur-doped graphene has a promising future in supercapacitor applications.
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硫掺杂石墨烯超级电容器的三维结构
杂原子的引入有利于防止石墨烯的堆积,提高石墨烯基电极材料的电化学性能。本工作以PEDOT:PSS为硫源制备了三维结构硫掺杂石墨烯(SG)电极材料,该材料可以在氧化石墨烯表面形成聚合物链,从而通过退火处理将硫原子成功掺杂到石墨烯晶格中。制备的SG电极材料在0.5 a g−1时具有254 F g−1的高比电容,明显优于纯还原氧化石墨烯材料。比电容的显著增加证实了硫掺杂石墨烯在超级电容器中的应用前景广阔。
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来源期刊
Journal of Nanoelectronics and Optoelectronics
Journal of Nanoelectronics and Optoelectronics 工程技术-工程:电子与电气
自引率
16.70%
发文量
48
审稿时长
12.5 months
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