(Digital Presentation) Facile Fabrication of Nickel and Sc-Doped Zirconia Cermet Electrode Thin Film on YSZ Substrate Via Screen-Printing for Solid Oxide Electrochemical Cells

Christine Mae Macalisang, Rinlee Cervera
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Abstract

Electrode materials play a key role in the performance of solid oxide electrochemical cells. In this study, screen-printing was used to fabricate a porous nickel – scandia-stabilized zirconia (Ni-ScSZ) cermet electrode on a dense YSZ solid electrolyte substrate. The effect of sintering temperatures, 1200°C and 1300°C, on the structure and morphology of the deposited films were investigated. The screen-printed films were sintered and then reduced under an Ar/5% H 2 gas environment at 700°C for 2h to form porous electrodes. The sintered films exhibited NiO and ScSZ cubic phases from X-ray diffraction (XRD) analysis. A desired porous morphology of NiO-ScSZ film sintered at 1200°C was achieved compared to a denser morphology sintered at 1300°C as revealed by the scanning electron microscopy (SEM) micrographs. XRD patterns of reduced samples suggested a complete reduction of cubic NiO to Ni with an increase in porosity as observed from SEM micrographs.
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固体氧化物电化学电池在YSZ衬底上丝网印刷制备掺杂镍和sc的氧化锆陶瓷电极薄膜
电极材料对固体氧化物电化学电池的性能起着至关重要的作用。在本研究中,采用丝网印刷技术在致密的YSZ固体电解质衬底上制备了多孔镍钪稳定氧化锆(Ni-ScSZ)金属陶瓷电极。研究了烧结温度1200℃和1300℃对镀层结构和形貌的影响。将丝网印刷薄膜烧结后,在Ar/5% h2气体环境下,在700℃下还原2h,形成多孔电极。通过x射线衍射(XRD)分析,烧结膜表现为NiO和ScSZ立方相。扫描电镜(SEM)显微照片显示,在1200°C下烧结的NiO-ScSZ膜具有理想的多孔形貌,而在1300°C下烧结的NiO-ScSZ膜具有致密的形貌。还原样品的XRD谱图表明,随着孔隙率的增加,立方NiO完全还原为Ni。
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