NBTI Effect Survey for Low Power Systems in Ultra-nanoregime

Abstract

Background: Electronic device scaling with the advancement of technology nodes maintains the performance of the logic circuits with area benefit. Metal oxide semiconductor (MOS) devices are the fundamental blocks for building logic circuits. Area minimization with higher efficiency of the circuits motivates the researchers of very large-scale integration (VLSI) design. Moreover, the reliability of digital circuits is one of the biggest challenges in VLSI technology. A major issue in reliability is negative bias temperature instability (NBTI) degradation. NBTI affects the efficiency and reliability of electronic devices. Method: This paper presents a review of NBTI physical-based mechanisms. NBTI's impact on VLSI circuits and techniques has been studied to mitigate and compensate for the effect of NBTI. Result: This review paper presents an idea to relate the NBTI and leakage mitigation techniques. This study gives an overview of the efficiency, complexity, and overhead of NBTI mitigation techniques and methodologies. Conclusion: This survey provides a brief idea about NBTI degradation by using reliability simulation. Moreover, the extensive aging effect is discussed in the paper.