The measurement and impact of negative oxygen ions during reactive sputter deposition

IF 8.1 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY Critical Reviews in Solid State and Materials Sciences Pub Date : 2023-09-21 DOI:10.1080/10408436.2023.2258159
D. Depla
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Abstract

AbstractMany thin film applications are based on oxides. The optimization of the oxide properties is an on-going process and requires a deep understanding of the deposition process. A typical feature of reactive (magnetron) sputter deposition is the presence of negative oxygen ions. Two groups of ions can be identified based on their energy. Low energy ions are generated in the bulk of the discharge. The high energy ions are emitted from the oxide or oxidized target surface. As these ions are generated at the cathode, they are accelerated by the electric field toward the growing film. Depending on the discharge voltage and the powering method, their energy is typically several tenths to hundreds electron volt. As such the ions can have a strong impact on the film properties. In the case of magnetron sputtering, this will lead to inhomogenous film properties over the substrate facing the locally eroded target. Due to their high energy, the trajectory of negative ions can be easily predicted which has led to several strategies to avoid negative ion bombardment such as facing target sputtering and off-axis sputtering. This paper reviews several facets of the production, the measurements and the impact on the film properties of negative ions during reactive sputtering. Despite the many illustrative studies on the impact of negative oxygen ions, quantification is often lacking as the negative ion yield is only known for a few oxides. The compilation of several literature sources allows the discussed trends to be placed in a quantitative framework.Keywords: Negative ion yieldmagnetron sputteringion assisted deposition AcknowledgementsThis work is dedicated to two researchers who have passed away recently and had a major impact on the scientific career of the author. The first researcher is Professor Johan (Jo) Haemers, a member of the same department, who assisted the research of the author in the development of special measuring set-ups, and in long discussions on science and other important things in life. The second researcher is Professor Joseph (Joe) Greene. His research approach, presentation style, and his interest in old and recent scientific literature was an example to many and to the author in particular.Disclosure statementThe author declares that there are no relevant financial or non-financial competing interests to report.
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反应溅射沉积过程中负氧离子的测量及其影响
许多薄膜的应用都是基于氧化物。氧化物性能的优化是一个持续的过程,需要对沉积过程有深入的了解。反应性(磁控)溅射沉积的一个典型特征是负氧离子的存在。根据它们的能量可以识别出两组离子。低能离子在大部分放电中产生。高能离子从氧化物或被氧化的目标表面发射出来。当这些离子在阴极产生时,它们在电场的作用下向生长的薄膜加速。根据放电电压和供电方法的不同,它们的能量通常为几十到几百电子伏特。因此,离子对薄膜的性能有很大的影响。在磁控溅射的情况下,这将导致面向局部侵蚀目标的衬底上的薄膜性质不均匀。由于负离子的高能量,其运动轨迹可以很容易地预测,这导致了几种避免负离子轰击的策略,如面对目标溅射和离轴溅射。本文综述了反应溅射过程中负离子的产生、测量及其对薄膜性能的影响。尽管有许多关于负氧离子影响的说明性研究,但由于只知道少数氧化物的负离子产率,因此往往缺乏量化。若干文献资料的汇编使所讨论的趋势可以放在一个定量的框架内。关键词:负离子屈服磁控溅射辅助沉积致谢本作品献给两位最近去世的研究人员,他们对作者的科学生涯产生了重大影响。第一位研究人员是约翰·海默斯教授,他是同一系的成员,他协助作者研究开发特殊测量装置,并就科学和生活中其他重要事情进行长时间的讨论。第二位研究员是约瑟夫·格林教授。他的研究方法,演讲风格,以及他对新旧科学文献的兴趣是许多人的榜样,尤其是作者。作者声明,没有相关的财务或非财务竞争利益需要报告。
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来源期刊
CiteScore
22.10
自引率
2.80%
发文量
0
审稿时长
3 months
期刊介绍: Critical Reviews in Solid State and Materials Sciences covers a wide range of topics including solid state materials properties, processing, and applications. The journal provides insights into the latest developments and understandings in these areas, with an emphasis on new and emerging theoretical and experimental topics. It encompasses disciplines such as condensed matter physics, physical chemistry, materials science, and electrical, chemical, and mechanical engineering. Additionally, cross-disciplinary engineering and science specialties are included in the scope of the journal.
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