Nitrogen-doping graphene at ambient conditions with N2-DBD-plasma and the role of neutral species

IF 2.9 3区 物理与天体物理 Q2 PHYSICS, APPLIED Plasma Processes and Polymers Pub Date : 2023-11-23 DOI:10.1002/ppap.202300168
Alina Begley, Giovanni Luca Bartolomeo, Daniel F. Abbott, Victor Mougel, Renato Zenobi
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Abstract

We doped nitrogen into monolayer graphene using reactive nitrogen species from a dielectric barrier discharge (DBD). After 30 s of treatment, the graphene monolayer had a moderate degree of damage (ID/IG = 1.2) and an increase in the N-atom (pyrrolic) and O-atom (mixed) content. During long treatment times (20 min), the treated area increased radially and the graphene was destroyed. Overall, the N-atom content increased with increasing operating voltage of the DBD source. When the graphene was treated with only neutral reactive nitrogen species, the N-atom content and type remained unchanged. Therefore, we hypothesize that the primary reactive species resulting in pyrrolic N-doping from the DBD are neutrals such as N(4S) and possibly N(2P).

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n2 - dbd等离子体环境下氮掺杂石墨烯及其中性物质的作用
我们利用来自介质阻挡放电(DBD)的活性氮物质将氮掺杂到单层石墨烯中。处理30 s后,单层石墨烯发生中等程度的损伤(ID/IG = 1.2), n原子(吡啶)和o原子(混合)含量增加。在较长的处理时间内(20分钟),处理面积呈放射状增加,石墨烯被破坏。总体而言,随着DBD源工作电压的增加,n原子含量增加。当仅用中性活性氮处理石墨烯时,n原子的含量和类型保持不变。因此,我们假设从DBD中导致吡咯烷N掺杂的主要反应物质是N(4S)和可能的N(2P)等中性物质。
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来源期刊
Plasma Processes and Polymers
Plasma Processes and Polymers 物理-高分子科学
CiteScore
6.60
自引率
11.40%
发文量
150
审稿时长
3 months
期刊介绍: Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.
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