{"title":"HAXPES: Inelastic background for characterization of nanostructured materials","authors":"Sven Tougaard","doi":"10.1002/sia.7273","DOIUrl":null,"url":null,"abstract":"Analysis of the spectrum of inelastically scattered electrons in XPS has been used for decades to determine the structure of materials on the nanoscale. Using the higher photon energies available in HAXPES, the method was recently shown to determine structures rather accurately with a more than 100 nm probing depth. In this paper, these HAXPES applications are briefly reviewed. Only two parameters are required for the analysis, namely, the inelastic mean free path and the cross section for inelastic electron scattering. We also discuss in detail how these parameters are best selected.","PeriodicalId":22062,"journal":{"name":"Surface and Interface Analysis","volume":"56 1","pages":""},"PeriodicalIF":1.6000,"publicationDate":"2023-11-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Surface and Interface Analysis","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.1002/sia.7273","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
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Abstract
Analysis of the spectrum of inelastically scattered electrons in XPS has been used for decades to determine the structure of materials on the nanoscale. Using the higher photon energies available in HAXPES, the method was recently shown to determine structures rather accurately with a more than 100 nm probing depth. In this paper, these HAXPES applications are briefly reviewed. Only two parameters are required for the analysis, namely, the inelastic mean free path and the cross section for inelastic electron scattering. We also discuss in detail how these parameters are best selected.
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Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).
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