Two-dimensional materials memory devices with floating metal gate for neuromorphic applications

Abstract

Emerging technologies such as neuromorphic computing and nonvolatile memories based on floating gate field-effect transistors (FETs) hold promise for addressing a wide range of artificial intelligence tasks. For example, neuromorphic computing seeks to emulate the human brain's functionality and employs a device that mimics the role of a synapse in the brain. However, achieving a high current ON/OFF ratio for the program and erase states of nonvolatile memory and neuromorphic computing device with a metal gate is necessary. This study demonstrates a multi-functional device based on heterostructures of transition metal dichalcogenides (TMDCs) with a metal floating gate. Five different channel materials (SnS₂, WSe₂, MoS₂, WS₂, and MoTe₂) were employed, and hexagonal boron nitride (h-BN) was used as a tunneling layer. The study found that n-type SnS₂ exhibits high endurance (15,000 cycles), good retention (2.4 × 10⁵ s), and the highest current ON/OFF ratio (∼2.58 × 10⁸) among the materials for the program and erase states. Moreover, the SnS₂ device exhibits synaptic behavior and offers highly stable operation at room temperature. Furthermore, the device shows high linearity in both potentiation and depression, with good retention time and repeatable results with low cycle-to-cycle variations. Additionally, the study used an artificial neural network (ANN) for MNIST simulation of image recognition and achieved the highest accuracy of ∼92 % based on the SnS₂ synaptic device experimental results. These findings pave the way for developing nonvolatile memory devices and their applications in brain-inspired neuromorphic computing and artificial intelligence systems.