Revealing cation and metal gradients in and underneath passive films of the stainless steel 1.4652 in acidic and alkaline electrolytes with angular resolved dual energy X-ray photo-electron spectroscopy

IF 1.6 4区 化学 Q4 CHEMISTRY, PHYSICAL Surface and Interface Analysis Pub Date : 2023-12-11 DOI:10.1002/sia.7275
Claes-Olof A. Olsson, Roland Hauert, Anna Neus Igual-Muñoz, Stefano Mischler, Patrik Schmutz
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Abstract

Passive films on the superaustenitic stainless steel 1.4652 were studied using angular resolved hard X-ray photo-electron spectroscopy (HAXPES), which provides an increased information depth compared to conventional X-ray photo-electron spectroscopy (XPS). Elemental depth profiles in the oxide as well as gradients in the underlying metal were established using a dedicated algorithm. The utility was exemplified for three different conditions of film formation: (i) as polished and as polarized to the high passive end in (ii) 1 M H2SO4 and (iii) 1 M NaOH. The use of a superaustenitic material ascertained that metal signals from the main contributors to film formation: Fe, Cr, Ni, and Mo remained above the detection limit throughout the data set. With the dual-source technique (XPS, HAXPES), it was possible to investigate metal gradients underneath the passive film. For polarizations in an acidic environment, a metallic nickel enrichment of the order of 5 Å was found. For a corresponding polarization in an alkaline environment, the metal region closest to the oxide/metal interface was enriched in iron, followed by concentration gradients down to about 50 Å into the metal.
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利用角分辨双能 X 射线光电子能谱揭示酸性和碱性电解质中 1.4652 不锈钢被动膜内和被动膜下的阳离子和金属梯度
使用角度分辨硬 X 射线光电子能谱 (HAXPES) 对超奥氏体不锈钢 1.4652 上的被动薄膜进行了研究,与传统的 X 射线光电子能谱 (XPS) 相比,HAXPES 提供了更高的信息深度。使用专用算法建立了氧化物中的元素深度剖面以及底层金属中的梯度。在三种不同的成膜条件下对其实用性进行了示范:(i) 在 (ii) 1 M H2SO4 和 (iii) 1 M NaOH 中抛光和极化至高被动端。超奥氏体材料的使用确定了薄膜形成的主要金属信号:在整个数据集中,铁、铬、镍和钼的金属信号始终高于检测限。利用双源技术(XPS、HAXPES),可以研究被动膜下的金属梯度。对于酸性环境中的极化,发现金属镍富集了 5 Å。在碱性环境中进行相应的极化时,最靠近氧化物/金属界面的金属区域富含铁,其次是向下约 50 Å 的金属浓度梯度。
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来源期刊
Surface and Interface Analysis
Surface and Interface Analysis 化学-物理化学
CiteScore
3.30
自引率
5.90%
发文量
130
审稿时长
4.4 months
期刊介绍: Surface and Interface Analysis is devoted to the publication of papers dealing with the development and application of techniques for the characterization of surfaces, interfaces and thin films. Papers dealing with standardization and quantification are particularly welcome, and also those which deal with the application of these techniques to industrial problems. Papers dealing with the purely theoretical aspects of the technique will also be considered. Review articles will be published; prior consultation with one of the Editors is advised in these cases. Papers must clearly be of scientific value in the field and will be submitted to two independent referees. Contributions must be in English and must not have been published elsewhere, and authors must agree not to communicate the same material for publication to any other journal. Authors are invited to submit their papers for publication to John Watts (UK only), Jose Sanz (Rest of Europe), John T. Grant (all non-European countries, except Japan) or R. Shimizu (Japan only).
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