Composition disorder in InAs/InAsSb superlattice by STM

Shengwen Xie, Lili Xie, Ruiqing Chai, Jiushuang Zhang, Qiyang Sun, Xu Zhang, Yao Yao, Ben Fan, Liqun Dai, Hongbo Bu, Ruimeng Zhang, Ruiming Chen
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Abstract

The interfacial asymmetry and compositional disorder caused by atomic segregation and exchange significantly affect the electrical properties of the InAs/InAsSb superlattice, leading to deviations from original designs. The study presents a quantitative analysis of the compositional asymmetry of the superlattice and its effects using a segregation model and 8-band k.p model. The composition disorder at each interface, primarily induced by Sb segregation, is examined through the reconstruction of the actual atomic sequence structure based on scanning tunneling microscopy results. Three different atomistic structures of the superlattice are modeled using the k.p method, including the ideal MBE-growth structure, a rebuilt structure with Sb segregation only at the InAs-on-InAsSb interface, and a rebuilt structure with Sb segregation at both interfaces. The results of the modeling highlight the significant influence of Sb segregation on the electronic properties of InAs/InAsSb superlattices.
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通过 STM 分析 InAs/InAsSb 超晶格中的成分紊乱
由原子偏析和交换引起的界面不对称和成分无序极大地影响了 InAs/InAsSb 超晶格的电学特性,导致其偏离原始设计。研究采用偏析模型和 8 波段 k.p 模型对超晶格的成分不对称及其影响进行了定量分析。根据扫描隧道显微镜的结果,通过重建实际的原子序列结构,研究了主要由锑偏析引起的每个界面上的成分失调。利用 k.p 方法对超晶格的三种不同原子结构进行了建模,包括理想的 MBE 生长结构、仅在 InAs-on-InAsSb 接口存在锑偏析的重建结构,以及在两个接口都存在锑偏析的重建结构。建模结果凸显了锑偏析对 InAs/InAsSb 超晶格电子特性的重大影响。
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