Atomic layer deposition in advanced display technologies: from photoluminescence to encapsulation

IF 16.1 1区 工程技术 Q1 ENGINEERING, MANUFACTURING International Journal of Extreme Manufacturing Pub Date : 2023-12-14 DOI:10.1088/2631-7990/ad15f5
Rong Chen, Kun Cao, Yanwei Wen, Fan Yang, Jian Wang, Xiao Liu, Bin Shan
{"title":"Atomic layer deposition in advanced display technologies: from photoluminescence to encapsulation","authors":"Rong Chen, Kun Cao, Yanwei Wen, Fan Yang, Jian Wang, Xiao Liu, Bin Shan","doi":"10.1088/2631-7990/ad15f5","DOIUrl":null,"url":null,"abstract":"\n Driven by the growing demand for next-generation displays, the evolution of advanced luminescent materials with exceptional photoelectric properties, such as quantum dots and phosphors are accelerating rapidly. Nevertheless, the primary challenge confronting the practical applications of these luminescent materials lie in meeting high durability requirements. This perspective delves into atomic layer deposition (ALD) developed for stabilizing luminescent materials, which is employed in the fabrication of flexible display devices through material modification, surface and interface engineering, encapsulation, cross-scale manufacturing, and simulations. To satisfy low-cost, high-efficiency, and high-reliability manufacturing requirements, equipments such as spatial ALD and fluidized ALD have been developed. The strategic approach establishes the groundwork for the development of ultra-stable luminescent materials, highly efficient LEDs, and thin-film packaging. This significantly enhances their potential applicability in LED illumination and backlight displays, marking a notable advancement in the display industry.","PeriodicalId":52353,"journal":{"name":"International Journal of Extreme Manufacturing","volume":null,"pages":null},"PeriodicalIF":16.1000,"publicationDate":"2023-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Extreme Manufacturing","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1088/2631-7990/ad15f5","RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
引用次数: 0

Abstract

Driven by the growing demand for next-generation displays, the evolution of advanced luminescent materials with exceptional photoelectric properties, such as quantum dots and phosphors are accelerating rapidly. Nevertheless, the primary challenge confronting the practical applications of these luminescent materials lie in meeting high durability requirements. This perspective delves into atomic layer deposition (ALD) developed for stabilizing luminescent materials, which is employed in the fabrication of flexible display devices through material modification, surface and interface engineering, encapsulation, cross-scale manufacturing, and simulations. To satisfy low-cost, high-efficiency, and high-reliability manufacturing requirements, equipments such as spatial ALD and fluidized ALD have been developed. The strategic approach establishes the groundwork for the development of ultra-stable luminescent materials, highly efficient LEDs, and thin-film packaging. This significantly enhances their potential applicability in LED illumination and backlight displays, marking a notable advancement in the display industry.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
先进显示技术中的原子层沉积:从光致发光到封装
在下一代显示器需求不断增长的推动下,量子点和荧光粉等具有特殊光电特性的先进发光材料正在迅速发展。然而,这些发光材料在实际应用中面临的主要挑战是如何满足高耐久性要求。本视角深入探讨了为稳定发光材料而开发的原子层沉积(ALD)技术,该技术通过材料改性、表面和界面工程、封装、跨尺度制造和模拟,用于制造柔性显示器件。为了满足低成本、高效率和高可靠性的制造要求,人们开发了空间 ALD 和流化 ALD 等设备。这种战略方法为开发超稳定发光材料、高效 LED 和薄膜封装奠定了基础。这大大提高了它们在 LED 照明和背光显示器中的潜在适用性,标志着显示器行业的显著进步。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
International Journal of Extreme Manufacturing
International Journal of Extreme Manufacturing Engineering-Industrial and Manufacturing Engineering
CiteScore
17.70
自引率
6.10%
发文量
83
审稿时长
12 weeks
期刊介绍: The International Journal of Extreme Manufacturing (IJEM) focuses on publishing original articles and reviews related to the science and technology of manufacturing functional devices and systems with extreme dimensions and/or extreme functionalities. The journal covers a wide range of topics, from fundamental science to cutting-edge technologies that push the boundaries of currently known theories, methods, scales, environments, and performance. Extreme manufacturing encompasses various aspects such as manufacturing with extremely high energy density, ultrahigh precision, extremely small spatial and temporal scales, extremely intensive fields, and giant systems with extreme complexity and several factors. It encompasses multiple disciplines, including machinery, materials, optics, physics, chemistry, mechanics, and mathematics. The journal is interested in theories, processes, metrology, characterization, equipment, conditions, and system integration in extreme manufacturing. Additionally, it covers materials, structures, and devices with extreme functionalities.
期刊最新文献
Design and micromanufacturing technologies of focused piezoelectric ultrasound transducers for biomedical applications Design and additive manufacturing of bionic hybrid structure inspired by cuttlebone to achieve superior mechanical properties and shape memory function Holistic and localized preparation methods for triboelectric sensors: principles, applications and perspectives Recent Advances in Fabricating High-Performance Triboelectric Nanogenerators via Modulating Surface Charge Density Laser-Forged Transformation and Encapsulation of Nanoalloys: Pioneering Robust Wideband Electromagnetic Wave Absorption and Shielding from GHz to THz
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1