Effect of trapped charges and ionic charges distribution on n+-on-p HgCdTe photodiode properties

Yuebo Liu, QiuLing Qiu, Wenyuan Liao, Hao Niu, Jiahui Yan, Zongbei Dai, Teng Ma, Shaohua Yang, C. Lai
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Abstract

The HgCdTe Photodiode is the most basic and important unit of HgCdTe IRFPA (Infra-red focal plane array) detectors, which have been widely used in the fields of security, fire protection, remote sensing and deep space detection. For HgCdTe IRFPA, the trapped charges of the HgCdTe material and the ionic charges introduced during the preparation process are the factors, other than environmental stress, that have the greatest impact on IRFPA performance. The trapped charges come from the trap energy level in the HgCdTe material, which exist during the crystal growth process and can be improved by adjusting the growth conditions, but it cannot be completely avoided. The ionic charges introduced during the process are generally concentrated at the interface and surface of the HgCdTe material, which can be reduced by process improvement, but cannot be completely avoided. In order to analyze the mechanism of multiple charges affecting the HgCdTe detector performance, a type of n+ -on-p HgCdTe Photodiode is selected as the object of this work, and the effects of the concentration and distribution of charges on the carrier distribution and energy band structure of the n+ -on-p HgCdTe are analyzed in detail. The introduction of additional net charge relative to an ideal n+ -on-p HgCdTe Photodiode leads to the aggregation or scavenging of local carriers and affects the energy band structure near the charge, creating additional potential barriers or potential wells, which is likely to cause device degradation. On this basis, the optoelectronic properties of the HgCdTe Photodiode have been investigated under infrared radiation at a wavelength of 9.5 μm, as the light I–V characteristics, the dynamic resistance–voltage characteristics, band structure and carrier density distribution. According to the results of this work, the quasi-fixed charges introduced by defects or contamination will directly affect the generation rate of photogenerated carriers and affect the I–V and R–V characteristics of the HgCdTe Photodiode, leading to phenomena such as rising dark currents, decreasing spectral response, and decreasing quantum efficiency.
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捕获电荷和离子电荷分布对 n+-on-p HgCdTe 光电二极管性能的影响
碲化镉汞光电二极管是碲化镉汞 IRFPA(红外焦平面阵列)探测器最基本、最重要的单元,已广泛应用于安防、消防、遥感和深空探测等领域。对于 HgCdTe IRFPA 而言,除环境应力外,HgCdTe 材料的阱电荷和制备过程中引入的离子电荷是对 IRFPA 性能影响最大的因素。俘获电荷来自 HgCdTe 材料中的俘获能级,它存在于晶体生长过程中,可以通过调整生长条件来改善,但无法完全避免。过程中引入的离子电荷一般集中在碲化镉汞材料的界面和表面,可以通过改进工艺来减少,但无法完全避免。为了分析多重电荷对 HgCdTe 检测器性能的影响机理,本研究选择了一种 n+ -on-p HgCdTe 光电二极管作为研究对象,详细分析了电荷的浓度和分布对 n+ -on-p HgCdTe 载流子分布和能带结构的影响。相对于理想的 n+ -on-p HgCdTe 光电二极管,额外净电荷的引入会导致局部载流子的聚集或清除,并影响电荷附近的能带结构,产生额外的势垒或势阱,从而可能导致器件退化。在此基础上,研究了 HgCdTe 光电二极管在波长为 9.5 μm 的红外辐射下的光 I-V 特性、动态电阻电压特性、能带结构和载流子密度分布。研究结果表明,缺陷或污染引入的准固定电荷会直接影响光生载流子的产生率,并影响 HgCdTe 光电二极管的 I-V 和 R-V 特性,从而导致暗电流上升、光谱响应降低和量子效率下降等现象。
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