Performance measurement of FlexRay pupil shaping module in lithography system

Abstract

The Flexray illumination technology is a crucial resolution enhancement technique for immersion photolithography machines operating at nodes of 28nm and below. The Flexray pupil shaping Module is the key component of this pupil shaping technique. This module enables the generation of arbitrary illumination modes by adjusting the angular spectrum of the beam through a micro mirror array (MMA). To meet the requirements of optical characteristic detection, a multiparameter detection method has been proposed. The optical performance parameters, including polar non-balance, opening angle, azimuth angle, and ellipticity, are simultaneously obtained by imaging the intensity distribution on the pupil plane. Experimental measurements and analysis of illumination shapes using the Flexray Pupil Shaping Module have been conducted. The experimental results demonstrate that this measurement method can be applied to test the performance of the Flexray Pupil Shaping Module in lithography system.