Influence of the multilayer dielectric design on the laser damage resistance of pulse-compression gratings

Abstract

Multilayer dielectric (MLD) gratings provide high diffraction efficiency and a high damage threshold. They represent the main solution to compressing a high-power laser beam. However, the laser resistance of MLD gratings limits the power of such facilities. The community devoted a lot of resources to increasing the damage threshold of those components. Today, it is well known that the etching profile plays a key role in the electric field distribution and consequently the laser resistance. In this paper, we focused our optimization on the multilayer dielectric stack to increase the laser-induced damage threshold (LIDT). We numerically and experimentally demonstrated the impact of the MLD stack on the electric field distribution and the LIDT. We manufactured two sets of three samples with identical etching profiles. The calculated electric field intensities were in good agreement with the measured LIDTs. These results demonstrated how to further optimize grating designs through the dielectric stack.