TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes.

IF 2.6 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY Beilstein Journal of Nanotechnology Pub Date : 2024-01-02 eCollection Date: 2024-01-01 DOI:10.3762/bjnano.15.1
Joshua Williams, Michael I Faley, Joseph Vimal Vas, Peng-Han Lu, Rafal E Dunin-Borkowski
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Abstract

We have prepared ferromagnetic nanostructures intended for the investigation of high-frequency magnetization dynamics in permalloy (Py) nanodisks using Lorentz transmission electron microscopy (LTEM) and electron holography. Py nanodisks were fabricated on thin silicon nitride (SiN) membranes using three different fabrication methods: lift-off, ion beam etching (IBE), and stencil lithography. They were further analyzed using different instruments, including scanning electron microscopy, LTEM, and electron holography. A bilayer of positive PMMA resist was utilized in the first fabrication method to form an undercut structure that guarantees a clean lift-off procedure. The second approach used dry etching with an Ar beam to etch a thin Py film, while an electron-beam-patterned negative resist mask kept the desired structure. In the third process, nanostencils (shadow masks) with submicrometer apertures were milled on SiN membranes using a focused ion beam. Furthermore, we have developed a new TEM sample preparation method, where we fabricated Py nanostructures on a bulk substrate with a SiN buffer layer and etched the substrate to create a thin SiN membrane under the Py nanostructure. Finally, we observed the vortex dynamics of the Py nanodisk under magnetic fields using LTEM and off-axis electron holography. A correlation between preparation methods and the properties of the Py nanostructures was made.

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在氮化硅膜上用 TEM 制备光刻图案化 permalloy 纳米结构的样品。
我们利用洛伦兹透射电子显微镜(LTEM)和电子全息技术制备了铁磁性纳米结构,用于研究过合金(Py)纳米盘的高频磁化动力学。在氮化硅(SiN)薄膜上使用三种不同的制造方法制造出了铂金纳米盘:升华法、离子束蚀刻法(IBE)和模板光刻法。使用不同的仪器,包括扫描电子显微镜、LTEM 和电子全息技术,对它们进行了进一步分析。第一种制造方法使用了双层正PMMA抗蚀剂,以形成一个下切结构,从而保证了清洁的剥离过程。第二种方法使用氩气束进行干蚀刻,蚀刻出一层薄薄的 Py 膜,而电子束图案化的负抗蚀剂掩膜则保持了所需的结构。在第三种方法中,使用聚焦离子束在氮化硅膜上铣制具有亚微米孔径的纳米模板(阴影掩膜)。此外,我们还开发了一种新的 TEM 样品制备方法,即在带有 SiN 缓冲层的块状基底上制备 Py 纳米结构,然后蚀刻基底,在 Py 纳米结构下形成一层薄的 SiN 膜。最后,我们利用 LTEM 和离轴电子全息技术观察了 Py 纳米盘在磁场下的涡旋动力学。我们发现了制备方法与 Py 纳米结构特性之间的相关性。
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来源期刊
Beilstein Journal of Nanotechnology
Beilstein Journal of Nanotechnology NANOSCIENCE & NANOTECHNOLOGY-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.70
自引率
3.20%
发文量
109
审稿时长
2 months
期刊介绍: The Beilstein Journal of Nanotechnology is an international, peer-reviewed, Open Access journal. It provides a unique platform for rapid publication without any charges (free for author and reader) – Platinum Open Access. The content is freely accessible 365 days a year to any user worldwide. Articles are available online immediately upon publication and are publicly archived in all major repositories. In addition, it provides a platform for publishing thematic issues (theme-based collections of articles) on topical issues in nanoscience and nanotechnology. The journal is published and completely funded by the Beilstein-Institut, a non-profit foundation located in Frankfurt am Main, Germany. The editor-in-chief is Professor Thomas Schimmel – Karlsruhe Institute of Technology. He is supported by more than 20 associate editors who are responsible for a particular subject area within the scope of the journal.
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