Ultralow operating voltage for energy conversion performance in Hf1–xZrxO2 thin films

IF 8.4 1区 材料科学 Q1 CHEMISTRY, PHYSICAL Journal of Materiomics Pub Date : 2024-01-23 DOI:10.1016/j.jmat.2024.01.001
{"title":"Ultralow operating voltage for energy conversion performance in Hf1–xZrxO2 thin films","authors":"","doi":"10.1016/j.jmat.2024.01.001","DOIUrl":null,"url":null,"abstract":"<div><p>Emerging ferroelectric and antiferroelectric HfO<sub>2</sub>-based thin films are attractive candidates for energy conversion and storage applications. In this work, the polar phase transformation between tetragonal and orthorhombic phases associated with ferroelectric or antiferroelectric behaviors is utilized to manipulate the electrocaloric cooling and energy storage performances in Zr-doped, woken up HfO<sub>2</sub> ultrathin films. A giant electrocaloric temperature change of up to 11.85 K in Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> with the morphotropic phase boundary (MPB) state and a high energy storage density of 39.34 J/cm<sup>3</sup> in the tetragonal phase-dominant Hf<sub>0.25</sub>Zr<sub>0.75</sub>O<sub>2</sub> system are obtained. More interestingly, contrary to overdoping and excessive electric fields, an appropriate Zr concentration of 0.5 and an applicable driving field of 1.91 MV/cm are desired for the electrocaloric effect, resulting in an ultralow operating voltage as low as 1.3 V in this 6.8 nm thick Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> film. These findings illustrate that the structural design strategy is a visible method for achieving optimal energy-related behaviors and highlight the great possibilities for building future energy-related devices.</p></div>","PeriodicalId":16173,"journal":{"name":"Journal of Materiomics","volume":null,"pages":null},"PeriodicalIF":8.4000,"publicationDate":"2024-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://www.sciencedirect.com/science/article/pii/S2352847824000170/pdfft?md5=66364e2d221828654394fcfac5008340&pid=1-s2.0-S2352847824000170-main.pdf","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Materiomics","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S2352847824000170","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, PHYSICAL","Score":null,"Total":0}
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Abstract

Emerging ferroelectric and antiferroelectric HfO2-based thin films are attractive candidates for energy conversion and storage applications. In this work, the polar phase transformation between tetragonal and orthorhombic phases associated with ferroelectric or antiferroelectric behaviors is utilized to manipulate the electrocaloric cooling and energy storage performances in Zr-doped, woken up HfO2 ultrathin films. A giant electrocaloric temperature change of up to 11.85 K in Hf0.5Zr0.5O2 with the morphotropic phase boundary (MPB) state and a high energy storage density of 39.34 J/cm3 in the tetragonal phase-dominant Hf0.25Zr0.75O2 system are obtained. More interestingly, contrary to overdoping and excessive electric fields, an appropriate Zr concentration of 0.5 and an applicable driving field of 1.91 MV/cm are desired for the electrocaloric effect, resulting in an ultralow operating voltage as low as 1.3 V in this 6.8 nm thick Hf0.5Zr0.5O2 film. These findings illustrate that the structural design strategy is a visible method for achieving optimal energy-related behaviors and highlight the great possibilities for building future energy-related devices.

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实现 Hf1-xZrxO2 薄膜能量转换性能的超低工作电压
基于 HfO2 的新兴铁电和反铁电薄膜是能量转换和存储应用的理想候选材料。在这项研究中,利用与铁电或反铁电行为相关的四方相和正方相之间的极性相变来操纵掺杂 Zr 的唤醒 HfO2 超薄薄膜的电致冷和储能性能。结果表明,在具有各向形态相边界(MPB)状态的 Hf0.5Zr0.5O2 中,电致冷温度变化高达 11.85 K;在以四方相为主的 Hf0.25Zr0.75O2 系统中,能量存储密度高达 39.34 J/cm3。更有趣的是,与过量掺杂和过大电场相反,电致发光效应需要适当的 0.5 Zr 浓度和 1.91 MV/cm 的驱动电场,从而使这层 6.8 nm 厚的 Hf0.5Zr0.5O2 薄膜的超低工作电压低至 1.3 V。这些研究结果表明,结构设计策略是实现最佳能源相关行为的可见方法,并凸显了构建未来能源相关设备的巨大可能性。
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来源期刊
Journal of Materiomics
Journal of Materiomics Materials Science-Metals and Alloys
CiteScore
14.30
自引率
6.40%
发文量
331
审稿时长
37 days
期刊介绍: The Journal of Materiomics is a peer-reviewed open-access journal that aims to serve as a forum for the continuous dissemination of research within the field of materials science. It particularly emphasizes systematic studies on the relationships between composition, processing, structure, property, and performance of advanced materials. The journal is supported by the Chinese Ceramic Society and is indexed in SCIE and Scopus. It is commonly referred to as J Materiomics.
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