Challenges in scaling of IPVD deposited Ta barriers on OSG low-k films: Carbonization of Ta by CHx radicals generated through VUV-induced decomposition of carbon-containing groups

IF 2.9 3区 物理与天体物理 Q2 PHYSICS, APPLIED Plasma Processes and Polymers Pub Date : 2024-01-22 DOI:10.1002/ppap.202300206
Alexey N. Ryabinkin, Alexey S. Vishnevskiy, Sergej Naumov, Alexander O. Serov, Konstantin I. Maslakov, Dmitry S. Seregin, Dmitry A. Vorotyntsev, Alexander F. Pal, Tatyana V. Rakhimova, Konstantin A. Vorotilov, Mikhail R. Baklanov
{"title":"Challenges in scaling of IPVD deposited Ta barriers on OSG low-k films: Carbonization of Ta by CHx radicals generated through VUV-induced decomposition of carbon-containing groups","authors":"Alexey N. Ryabinkin, Alexey S. Vishnevskiy, Sergej Naumov, Alexander O. Serov, Konstantin I. Maslakov, Dmitry S. Seregin, Dmitry A. Vorotyntsev, Alexander F. Pal, Tatyana V. Rakhimova, Konstantin A. Vorotilov, Mikhail R. Baklanov","doi":"10.1002/ppap.202300206","DOIUrl":null,"url":null,"abstract":"The effect of vacuum ultraviolet (VUV) radiation during ionized physical vapor deposition (IPVD) of tantalum barriers on various porous organosilicate glass low-<i>k</i> SiCOH films is studied using advanced diagnostics and quantum chemical calculations. VUV photons break the Si–C bonds, releasing hydrocarbon radicals from the pore surfaces. These radicals, trapped in pores that are partially sealed by tantalum deposition, can either react with tantalum to form carbide-like compounds, TaC<sub><i>x</i></sub>, or be redeposited in the pores as CH<sub><i>x</i></sub> polymers. This is evidenced by a decrease in CH<sub>3</sub> groups that correlates with an increase in TaC<sub><i>x</i></sub>. The formation of TaC<sub><i>x</i></sub> poses a significant challenge in the back end of line (BEOL) technology when reducing the barrier thickness.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"15 1","pages":""},"PeriodicalIF":2.9000,"publicationDate":"2024-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Processes and Polymers","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1002/ppap.202300206","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"PHYSICS, APPLIED","Score":null,"Total":0}
引用次数: 0

Abstract

The effect of vacuum ultraviolet (VUV) radiation during ionized physical vapor deposition (IPVD) of tantalum barriers on various porous organosilicate glass low-k SiCOH films is studied using advanced diagnostics and quantum chemical calculations. VUV photons break the Si–C bonds, releasing hydrocarbon radicals from the pore surfaces. These radicals, trapped in pores that are partially sealed by tantalum deposition, can either react with tantalum to form carbide-like compounds, TaCx, or be redeposited in the pores as CHx polymers. This is evidenced by a decrease in CH3 groups that correlates with an increase in TaCx. The formation of TaCx poses a significant challenge in the back end of line (BEOL) technology when reducing the barrier thickness.

Abstract Image

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
在 OSG 低 K 薄膜上扩展 IPVD 沉积 Ta 势垒所面临的挑战:紫外线诱导含碳基团分解产生的 CHx 自由基使 Ta 碳化
利用先进的诊断技术和量子化学计算方法,研究了在各种多孔有机硅玻璃低 K SiCOH 薄膜上进行钽隔阂离子化物理气相沉积(IPVD)过程中真空紫外线(VUV)辐射的影响。紫外光子破坏了 Si-C 键,从孔隙表面释放出碳氢化合物自由基。这些自由基被困在部分被钽沉积密封的孔隙中,既可以与钽反应形成类碳化物 TaCx,也可以作为 CHx 聚合物重新沉积在孔隙中。这表现在 CH3 基团的减少与 TaCx 的增加相关。在减少阻挡层厚度时,TaCx 的形成给后端生产线 (BEOL) 技术带来了巨大挑战。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Plasma Processes and Polymers
Plasma Processes and Polymers 物理-高分子科学
CiteScore
6.60
自引率
11.40%
发文量
150
审稿时长
3 months
期刊介绍: Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.
期刊最新文献
Electrophoretic Deposition of Multi‐Walled Carbon Nanotubes: The Key Role of Plasma Functionalization and Polymerization Issue Information: Plasma Process. Polym. 9/2024 Outside Front Cover: Plasma Process. Polym. 9/2024 Effect of the pH on the Formation of Gold Nanoparticles Enabled by Plasma‐Driven Solution Electrochemistry Effects of cold atmospheric plasma‐treated medium on HaCaT and HUVEC cells in vitro
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1