Phase-controlled growth of indium selenide by metalorganic chemical vapor deposition

IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Journal of Crystal Growth Pub Date : 2024-02-08 DOI:10.1016/j.jcrysgro.2024.127612
Yukihiro Endo, Yoshiaki Sekine, Yoshitaka Taniyasu
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Abstract

Indium selenide (InxSey), group III-VI semiconductor, has various crystal phases, so that the growth technique for controlling the crystal phase is necessary for studying the novel properties as well as the device applications. In this work, we demonstrate the phase-controlled growth of InxSey using metalorganic chemical vapor deposition. As the growth temperature increases, the crystal phase changes from InSe, β-In2Se3 to γ-In2Se3, which can be explained by their thermal stability. Besides, as the gas-phase VI/III source molar ratio increases, the crystal phase changes from InSe to In2Se3, indicating that Se-rich surface stoichiometry results in Se-rich crystal phase, i.e. In2Se3. We summarized the crystal phases depending on the growth temperature and the VI/III source molar ratio as a phase diagram. The InxSey growth near the phase boundary between InSe and β-In2Se3 take place under surface-reaction-limited regime and the dissociation of Se source mainly controls the surface stoichiometry. This phase diagram will be a guideline for the phase-pure InxSey synthesis and pave the way for the optoelectronic applications.

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通过金属有机化学气相沉积实现硒化铟的相控生长
硒化铟(InxSey)是 III-VI 族半导体,具有多种晶相,因此控制晶相的生长技术对于研究其新颖特性和器件应用非常必要。在这项工作中,我们利用金属有机化学气相沉积技术展示了 InxSey 的相控生长。随着生长温度的升高,晶相从 InSe、β-In2Se3 转变为 γ-In2Se3,这可以用它们的热稳定性来解释。此外,随着气相 VI/III 源摩尔比的增加,晶相从 InSe 变为 In2Se3,这表明富 Se 表面化学计量导致富 Se 晶相,即 In2Se3。我们将不同生长温度和 VI/III 源摩尔比下的晶体相归纳为相图。InxSey 在 InSe 和 β-In2Se3 相边界附近的生长是在表面反应受限的条件下进行的,Se 源的解离主要控制着表面化学计量。该相图将为相纯 InxSey 的合成提供指导,并为光电应用铺平道路。
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来源期刊
Journal of Crystal Growth
Journal of Crystal Growth 化学-晶体学
CiteScore
3.60
自引率
11.10%
发文量
373
审稿时长
65 days
期刊介绍: The journal offers a common reference and publication source for workers engaged in research on the experimental and theoretical aspects of crystal growth and its applications, e.g. in devices. Experimental and theoretical contributions are published in the following fields: theory of nucleation and growth, molecular kinetics and transport phenomena, crystallization in viscous media such as polymers and glasses; crystal growth of metals, minerals, semiconductors, superconductors, magnetics, inorganic, organic and biological substances in bulk or as thin films; molecular beam epitaxy, chemical vapor deposition, growth of III-V and II-VI and other semiconductors; characterization of single crystals by physical and chemical methods; apparatus, instrumentation and techniques for crystal growth, and purification methods; multilayer heterostructures and their characterisation with an emphasis on crystal growth and epitaxial aspects of electronic materials. A special feature of the journal is the periodic inclusion of proceedings of symposia and conferences on relevant aspects of crystal growth.
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