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Modification of molybdate flux with LiF for LiB3O5 crystal growth
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-11-29 DOI: 10.1016/j.jcrysgro.2024.128026
Elona Khan , Valery Ryabov , Maria Samoilova , Ekaterina Simonova , Konstantin Kokh
The present study concerns the Li2O-B2O3-MoO3-LiF system. LiB3O5 and Li3B7O12 crystals were obtained by spontaneous crystallisation and TSSG. The addition of LiF to the molybdate flux represents a promising avenue for the growth of lithium borate crystals.
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引用次数: 0
Facile synthesis of WO3.H2O nanostructures for efficient photocatalytic and electrochemical properties
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-11-26 DOI: 10.1016/j.jcrysgro.2024.128017
Sana Islam , Imran Aslam , Tariq Mahmood , M. Hassan Farooq
WO3·H2O nanostructures have fascinated momentous consideration due to their distinctive properties such as small bandgaps as compared to WO3, tunable morphology, and distinct photocatalytic properties. These nanostructures were successfully fabricated by the hydrothermal method (by varying solvent volume) and characterized by X-ray diffraction (XRD), EDX, and FESEM to analyze the crystallinity, chemical composition, and morphology which indicated the average size of 140–190 nm. The presence of O-W-O and O = W chemical bonds, and O–H stretching vibrations in FTIR spectrum demonstrate the fabrication of WO3·H2O nanostructures. The UV–Visible spectroscopy and PL study were conducted which presented that the optical bandgaps lies in the range (2.16–2.5 eV) which were beneficial for photocatalytic activity. To assess the photocatalytic response, rhodamine B, methyl orange, reactive orange 16 dyes and additionally industrial wastewater were used. It was noted that the photodegradation efficiency of sample 1 was higher than other samples for all dyes. The percentage degradation for RhB (99.5 %), MO (97.5 %), RO16 (88.7 %), and IW (99.5 %) and the reaction rate constants are RhB (0.0768 min−1), MO (0.03991 min−1), RO16 (0.02363 min−1), and IW (0.0744 min−1). The sample 1 have 1.5 times higher photocatalytic properties than all other samples, attributed to its lowest bandgap 2.16 eV, and lower charge carriers recombination rate. Moreover, the electrochemical properties of WO3·H2O nanostructures were also evaluated presenting a specific capacitance of 1209F g−1. This analysis highlights their potential in environmental remediation and supercapacitor applications.
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引用次数: 0
One-pot synthesis and improved photocatalytic performance of Sn/Cl co-doped TiO2-ZnO nano-heterojunctions Sn/Cl 共掺杂 TiO2-ZnO 纳米异质结的一锅合成及更好的光催化性能
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-11-24 DOI: 10.1016/j.jcrysgro.2024.128016
Jingyi Yu , Hao Sun , Cong Zheng , Weiwei Jiang , Nan Wang , Zhiqiang Li , Sumei Wu , Hualong Tao , Tingting Yao , Hualin Wang , Shimin Liu , Chaoqian Liu , Wanyu Ding , Zhihua Zhang
Pure TiO2, Sn/Cl co-doped TiO2 and Sn/Cl co-doped TiO2-ZnO were fabricated and compared by a novel one-pot method to improve the photocatalytic performance of pure TiO2, which accomplishes the construction of heterojunctions simultaneously with doping by volatile solid solution. TG-DSC, XRD, FTIR, XPS, SEM, EDS, TEM, SAED, UV–Vis, PL and EIS were characterized to investigate the influence mechanism of Sn/Cl co-doping and ZnO content (0, 25, 50, 75, and 100 mol.%) on the thermal effect, crystal structure, morphology, composition, charge transfer behavior and photocatalytic performance of samples. Results indicate that ZnO appears and SnO2 disappears simultaneously with anatase TiO2 as the main phase by increasing ZnO content, and the morphology is changed from irregular sphere to sphere-sheet and sphere-plate correspondingly. The photocatalytic degradation efficiency first increases and then decreases, and achieves the maximum value of 73 % by SCT/Z50 which has sphere-sheet heterostructure containing more hydroxyl radicals, under 15 W weak-UV light irradiations for 3 h using methyl orange (MO) as pollutant. The excellent photocatalytic performance is attributed to the structural and morphological effects of Sn/Cl co-doping and ZnO introduction, which can increase the electron-hole separation efficiency. The optimized composition also has great potential in practical photocatalytic application due to the commercial advantage that ZnO is much cheaper than TiO2.
为了提高纯TiO2的光催化性能,采用一种新颖的一锅法制备并比较了纯TiO2、Sn/Cl共掺杂TiO2和Sn/Cl共掺杂TiO2-ZnO,该方法通过挥发性固溶体在掺杂的同时构建异质结。研究人员利用 TG-DSC、XRD、FTIR、XPS、SEM、EDS、TEM、SAED、UV-Vis、PL 和 EIS 表征了 Sn/Cl 共掺杂和 ZnO 含量(0、25、50、75 和 100 mol.%)对样品的热效应、晶体结构、形貌、组成、电荷转移行为和光催化性能的影响机制。结果表明,随着 ZnO 含量的增加,以锐钛矿型 TiO2 为主相的 ZnO 出现,SnO2 消失,形貌也相应地由不规则球状变为球-片状和球-板状。以甲基橙(MO)为污染物,在 15 W 弱紫外光照射 3 小时后,光催化降解效率先升高后降低,其中含有较多羟基自由基的球片状异质结构的 SCT/Z50 的光催化降解效率达到最高值 73%。优异的光催化性能归功于 Sn/Cl 共掺杂和 ZnO 引入的结构和形态效应,它们可以提高电子-空穴分离效率。由于 ZnO 比 TiO2 便宜得多这一商业优势,该优化组合在实际光催化应用中也具有很大的潜力。
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引用次数: 0
Facile green synthesis of ZnO/ZrO2 nanocomposite for photocatalytic degradation and chromium (VI) reduction 用于光催化降解和还原铬 (VI) 的 ZnO/ZrO2 纳米复合材料的简便绿色合成方法
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-11-22 DOI: 10.1016/j.jcrysgro.2024.128009
H.C. Sathisha , Anitha , G. Krishnamurthy , G. Nagaraju
In the field of nanoscience, using plant materials to create nanoparticles (NPs) is becoming growing in popularity and offers a number of benefits over physicochemical techniques. The green combustion approach effectively synthesized ZnO/ZrO2 nanocomposite (NCs) using powdered Butea monosperma (BM) leaf as the green fuel. The nature of NCs was confirmed through (X-ray Diffraction) XRD revealed that presence of hexagonal ZnO and cubic of ZrO2 phase. The morphology of NCs as seen by (Scanning Electron Microscopy) SEM and (Transmission Electron Microscopy) TEM reveals a fair distribution and non-uniform spherical shape. (Energy Dispersive X-Ray Analysis) EDAX pattern indicates the presence of zinc, zirconium and oxygen components. (Fourier Transform Infrared Spectroscopy) FT-IR spectrum obtained the metal–oxygen bonding in NCs. By applying the Tauc relation to calculate the optical energy band gap value of the sample is 3.34 eV. UV light is used to conduct the investigation of photocatalytic degradation of methylene blue (MB) dye. The NCs have superior degradation efficiency up to 99 % dye degradation is performed in 150 min. Furthermore, NCs exhibit a hazardous chromium (VI) decrease of up to 62 %. The collected results demonstrated that ZnO/ZrO2 NCs are the best photocatalyst for MB degradation and chromium reduction.
在纳米科学领域,利用植物材料制造纳米粒子(NPs)正变得越来越受欢迎,与物理化学技术相比,它具有许多优点。利用单叶榨菜(BM)粉末作为绿色燃料,绿色燃烧方法有效地合成了 ZnO/ZrO2 纳米复合材料(NCs)。通过(X 射线衍射)X 射线衍射显示出六方氧化锌和立方氧化锆相的存在,从而确认了纳米复合材料的性质。通过扫描电子显微镜(SEM)和透射电子显微镜(TEM)观察 NCs 的形态,发现其分布均匀且呈非均匀球形。(能量色散 X 射线分析)EDAX 图谱显示存在锌、锆和氧成分。(傅立叶变换红外光谱)傅立叶变换红外光谱显示了 NCs 中的金属氧键。应用陶氏关系计算出样品的光能带隙值为 3.34 eV。利用紫外光对亚甲基蓝(MB)染料进行光催化降解研究。NCs 具有卓越的降解效率,在 150 分钟内就能降解高达 99% 的染料。此外,NCs 对有害铬 (VI) 的降解率高达 62%。收集到的结果表明,ZnO/ZrO2 NCs 是降解甲基溴和减少铬的最佳光催化剂。
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引用次数: 0
Continuous crystal growth and homogeneity of 2-inch Ca3Ta(Ga,Al)3Si2O14 bulk single crystals
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-11-22 DOI: 10.1016/j.jcrysgro.2024.128013
Yuui Yokota , Yuji Ohashi , Yasuhiro Shoji , Akira Yoshikawa
Langasite-type Ca3Ta(Ga,Al)3Si2O14 (CTGAS) piezoelectric bulk single crystals with a 2-inch diameter were continuously grown by the Czochralski (Cz) method using the residual melt after crystal growth and recharging. The first and second bulk single crystals without cracks were grown using a continuous crystal growth process. However, the third bulk single crystal included many cracks, suggesting that the cracks were generated because of the change in melt composition by the recharging process originating from the difference between the stoichiometric and congruent compositions. By evaluating the velocity distribution using ultrasonic waves, an area with low leaky surface acoustic wave (LSAW) velocity was observed at the center of the bulk single crystal.
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引用次数: 0
Morphological evolution and optical properties of ZnO microstructures 氧化锌微结构的形态演变和光学特性
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-11-21 DOI: 10.1016/j.jcrysgro.2024.128012
Gaoxiang Fan, Jiling Li, Yuhua Yang
Three kinds of ZnO microstructures are controlled synthesized on silicon substrates including microcolumns, microfences and hollow microcolumns. The morphological evolution of the prepared ZnO microstructures are systematically analyzed. It is found that the growth parameters play crucial roles on it, such as the growth temperature and the concentration of gaseous source atoms on the growth surface. Moreover, the optical characterizations suggest the structural advantages of ZnO microfence, that is, its excitation density has been enhanced due to its special symmetric hexagonal array, which has also switched on the p-band emission.
在硅衬底上控制合成了三种氧化锌微结构,包括微柱、微栅和空心微柱。系统分析了所制备的氧化锌微结构的形态演变。研究发现,生长温度和生长表面的气态源原子浓度等生长参数对其起着至关重要的作用。此外,光学特性分析表明了氧化锌微栅栏的结构优势,即其特殊的对称六边形阵列提高了激发密度,同时也开启了 p 波段发射。
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引用次数: 0
Study of the structural, morphological, and J–V characteristics of Zr-doped barium calcium strontium titanate 掺杂 Zr 的钛酸钡钙锶的结构、形态和 J-V 特性研究
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-11-20 DOI: 10.1016/j.jcrysgro.2024.128011
Md. Parvej Mosaraf Sohel, Abdullah Al Moyeen, Ainul Islam Safi, Md. Sadrul Rahman Dipto, Shaadnan Bin Syed
Barium calcium strontium titanate (BCST) ceramics are promising materials for energy storage and dielectric applications, but their performance is often limited by high leakage currents and structural instability. To address these, Zr-doped BCST (Ba0.7Ca0.15Sr0.15ZrxTi(1-x)O3; x = 0.0, 0.1, 0.15, 0.2) ceramics were synthesized via the solid-state reaction method with the objective of reducing leakage currents in BCST ceramics. X-ray diffraction (XRD) analysis confirmed a single-phase-pseudocubic ABO3 structure with space group Pm-3mn all samples and a secondary ZrO2 phase in Zr-doped samples. Rietveld refinement revealed an increase in lattice parameters and unit cell volumes with higher doping, ranging from 62.483 to 63.363 Å3. The SEM images showed cubic and rod-shaped morphologies with agglomerates and pores, with grain sizes ranging between 0.543 μm and 0.727 μm. EDS analysis confirmed the presence of all constituent elements. Current density–voltage (J–V) analysis showed that the leakage current density increased non-linearly with voltage for all samples, with Zr doping significantly reducing leakage currents by enhancing chemical stability and suppressing electron jumps between Ti4+ and Ti3+. Among the samples, undoped BCST exhibited the highest leakage current, while Zr-doped samples showed improved resistivity and lower leakage currents. These properties make Zr-doped BCST ceramics promising candidates for energy storage devices and dielectric applications requiring high resistivity and low leakage currents.
钛酸钡钙锶(BCST)陶瓷是一种很有前途的储能和介电应用材料,但其性能往往受到高漏电流和结构不稳定性的限制。为了解决这些问题,我们通过固态反应方法合成了掺杂 Zr 的 BCST(Ba0.7Ca0.15Sr0.15ZrxTi(1-x)O3;x = 0.0、0.1、0.15、0.2)陶瓷,目的是降低 BCST 陶瓷的泄漏电流。X 射线衍射(XRD)分析证实,所有样品都具有空间群为 Pm-3mn 的单相伪立方体 ABO3 结构,而在掺杂 Zr 的样品中则存在次生 ZrO2 相。Rietveld 精炼显示,随着掺杂量的增加,晶格参数和单胞体积也在增加,范围从 62.483 Å3 到 63.363 Å3。扫描电子显微镜图像显示出立方体和棒状的形态,并伴有团聚和孔隙,晶粒大小在 0.543 μm 和 0.727 μm 之间。EDS 分析证实了所有组成元素的存在。电流密度-电压(J-V)分析表明,所有样品的漏电流密度都随电压呈非线性增长,掺杂 Zr 能增强化学稳定性并抑制 Ti4+ 和 Ti3+ 之间的电子跃迁,从而显著降低漏电流。在所有样品中,未掺杂 BCST 的漏电流最高,而掺杂 Zr 的样品电阻率更高,漏电流更低。这些特性使得掺杂 Zr 的 BCST 陶瓷有望用于要求高电阻率和低漏电流的储能设备和介电应用。
{"title":"Study of the structural, morphological, and J–V characteristics of Zr-doped barium calcium strontium titanate","authors":"Md. Parvej Mosaraf Sohel,&nbsp;Abdullah Al Moyeen,&nbsp;Ainul Islam Safi,&nbsp;Md. Sadrul Rahman Dipto,&nbsp;Shaadnan Bin Syed","doi":"10.1016/j.jcrysgro.2024.128011","DOIUrl":"10.1016/j.jcrysgro.2024.128011","url":null,"abstract":"<div><div>Barium calcium strontium titanate (BCST) ceramics are promising materials for energy storage and dielectric applications, but their performance is often limited by high leakage currents and structural instability. To address these, Zr-doped BCST (Ba<sub>0.7</sub>Ca<sub>0.15</sub>Sr<sub>0.15</sub>Zr<sub>x</sub>Ti<sub>(1-x)</sub>O<sub>3</sub>; x = 0.0, 0.1, 0.15, 0.2) ceramics were synthesized via the solid-state reaction method with the objective of reducing leakage currents in BCST ceramics. X-ray diffraction (XRD) analysis confirmed a single-phase-pseudocubic ABO3 structure with space group <em>Pm-3m</em>n all samples and a secondary ZrO2 phase in Zr-doped samples. Rietveld refinement revealed an increase in lattice parameters and unit cell volumes with higher doping, ranging from 62.483 to 63.363 Å<sup>3</sup>. The SEM images showed cubic and rod-shaped morphologies with agglomerates and pores, with grain sizes ranging between 0.543 μm and 0.727 μm. EDS analysis confirmed the presence of all constituent elements. Current density–voltage (J–V) analysis showed that the leakage current density increased non-linearly with voltage for all samples, with Zr doping significantly reducing leakage currents by enhancing chemical stability and suppressing electron jumps between Ti<sup>4+</sup> and Ti<sup>3+</sup>. Among the samples, undoped BCST exhibited the highest leakage current, while Zr-doped samples showed improved resistivity and lower leakage currents. These properties make Zr-doped BCST ceramics promising candidates for energy storage devices and dielectric applications requiring high resistivity and low leakage currents.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"651 ","pages":"Article 128011"},"PeriodicalIF":1.7,"publicationDate":"2024-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142719610","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of substrate misorientation angle on the structural properties of N-polar GaN grown by hot-wall MOCVD on 4H-SiC(0001̄) 通过热壁 MOCVD 在 4H-SiC(0001̄) 上生长的 N 极 GaN 的结构特性受衬底错向角的影响
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-11-19 DOI: 10.1016/j.jcrysgro.2024.127971
Hengfang Zhang , Jr.-Tai Chen , Alexis Papamichail , Ingemar Persson , Dat Q. Tran , Plamen P. Paskov , Vanya Darakchieva
The effects of substrate misorientation angle direction and degree on the structural properties of N-polar GaN grown by a novel multi-step temperature epitaxial approach using hot-wall metal–organic chemical vapor deposition (MOCVD) on 4H-SiC (0001̄) substrates is investigated. The surface morphology and X-ray diffraction (XRD) rocking curves (RCs) for both symmetric and asymmetric Bragg peaks of the multi-step temperature N-polar GaN are compared to a material obtained in a two-step temperature process. In the latter the temperature in the second step was varied so that it corresponds to the growth temperatures in each of the steps of the multi-step process. Different step-flow patterns are obtained on the substrates with a misorientation angle of 4° depending on whether its direction is towards the a-plane or the m-plane. In contrast, for a misorientation angle of 1° towards the m-plane, the surface morphology of N-polar GaN is dominated by hexagonal hillocks when using the 2-step temperature process and a step meandering growth mode is observed when employing the multi-step temperature process. These results are discussed and explained in terms of kinetic and thermodynamic considerations. As the growth temperature of the GaN layer in the 2-step temperature process increases from 950 °C to 1100 °C, the surface roughness and RCs widths decrease for the three types of substrates indicating improved crystal quality at higher temperature. The multi-step epitaxial approach is shown to be beneficial for achieving smooth surface morphology and low defect density of N-polar GaN layers grown on C-face SiC substrates with a misorientation angle of 4° and an RMS value of 1.5 nm over an area of 20 μm × 20 μm is attained when the substrate mis-cut is towards the m-plane.
研究了在 4H-SiC (0001̄) 基底上使用热壁金属有机化学气相沉积 (MOCVD) 的新型多步温度外延方法生长的 N 极 GaN 的基底错向角方向和程度对其结构特性的影响。将多级温度 N 极 GaN 的对称和非对称布拉格峰的表面形貌和 X 射线衍射(XRD)摇摆曲线(RC)与通过两级温度工艺获得的材料进行了比较。在后者中,第二步的温度是变化的,以便与多步工艺中每一步的生长温度相对应。在错位角为 4° 的基底上,根据其方向是朝向 a 平面还是 m 平面,可以获得不同的阶梯流图案。与此相反,在朝向 m 平面的方向错位角为 1° 时,采用两步温度制程时,N 极 GaN 的表面形态以六角丘为主,而采用多步温度制程时,则出现了阶梯蜿蜒生长模式。我们从动力学和热力学的角度对这些结果进行了讨论和解释。随着两步温度工艺中 GaN 层的生长温度从 950 ℃ 升高到 1100 ℃,三种衬底的表面粗糙度和 RCs 宽度都有所下降,这表明在较高温度下晶体质量有所改善。多步外延方法有利于在 C 面碳化硅衬底上生长的 N 极 GaN 层获得平滑的表面形貌和较低的缺陷密度,当衬底错切朝向 m 平面时,在 20 μm × 20 μm 的区域内错位角为 4°,均方根值为 1.5 nm。
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引用次数: 0
Optimizing MPCVD systems for diamond growth through advanced microwave transmission theory 通过先进的微波传输理论优化用于金刚石生长的 MPCVD 系统
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-11-19 DOI: 10.1016/j.jcrysgro.2024.128008
Xiaobin Hao , Yicun Li , Xia Kong , Jilei Lyu , Kunlong Zhao , Jiwen Zhao , Sen Zhang , Dongyue Wen , Kang Liu , V.G. Ralchenko , Benjian Liu , Bing Dai , Jiaqi Zhu
Diamond, renowned for its exceptional properties, stands as the ultimate semiconductor material. Microwave plasma chemical vapor deposition (MPCVD) is pivotal in advancing diamond’s functional applications. The effectiveness of the MPCVD system hinges on the efficient transmission of microwave energy to the resonant cavity. Additionally, the system must form a large-area, high-intensity hemispherical standing-wave electric field in the deposition area. Thus, a well-conceived optimization design for the microwave transmission and resonance systems is imperative. This paper introduces a design methodology for MPCVD systems, aligning plasma requirements for diamond growth with the transmission and distribution characteristics of the microwave electromagnetic field, which means that system optimization can be achieved without the need for complex multiple physical fields simulations. The average electric field intensity up to 3.24 × 105 V/m is obtained by using the dual-objective optimization function as the comprehensive optimization objective of the metal boundaries of the reactor. Based on simulation findings, an MPCVD system operating at 2450 MHz was designed, resulting in a single-crystal diamond with a high average growth rate of 11.5 μm/h. Further reduction of the microwave frequency to 915 MHz enabled the preparation of a 4-inch polycrystalline diamond film, achieving an average growth rate close to 3.5 μm/h.
金刚石以其卓越的性能而闻名于世,是一种终极半导体材料。微波等离子体化学气相沉积(MPCVD)在推动金刚石的功能应用方面发挥着关键作用。微波等离子体化学气相沉积系统的有效性取决于向谐振腔高效传输微波能量。此外,系统还必须在沉积区域形成大面积、高强度的半球形驻波电场。因此,必须对微波传输和谐振系统进行周密的优化设计。本文介绍了 MPCVD 系统的设计方法,使金刚石生长的等离子体要求与微波电磁场的传输和分布特性相一致,这意味着无需复杂的多物理场模拟就能实现系统优化。利用双目标优化函数作为反应器金属边界的综合优化目标,可获得高达 3.24 × 105 V/m 的平均电场强度。根据模拟结果,设计了一种工作频率为 2450 MHz 的 MPCVD 系统,从而获得了平均生长速率高达 11.5 μm/h 的单晶金刚石。将微波频率进一步降低到 915 MHz 后,制备出了 4 英寸的多晶金刚石薄膜,平均生长速度接近 3.5 μm/h。
{"title":"Optimizing MPCVD systems for diamond growth through advanced microwave transmission theory","authors":"Xiaobin Hao ,&nbsp;Yicun Li ,&nbsp;Xia Kong ,&nbsp;Jilei Lyu ,&nbsp;Kunlong Zhao ,&nbsp;Jiwen Zhao ,&nbsp;Sen Zhang ,&nbsp;Dongyue Wen ,&nbsp;Kang Liu ,&nbsp;V.G. Ralchenko ,&nbsp;Benjian Liu ,&nbsp;Bing Dai ,&nbsp;Jiaqi Zhu","doi":"10.1016/j.jcrysgro.2024.128008","DOIUrl":"10.1016/j.jcrysgro.2024.128008","url":null,"abstract":"<div><div>Diamond, renowned for its exceptional properties, stands as the ultimate semiconductor material. Microwave plasma chemical vapor deposition (MPCVD) is pivotal in advancing diamond’s functional applications. The effectiveness of the MPCVD system hinges on the efficient transmission of microwave energy to the resonant cavity. Additionally, the system must form a large-area, high-intensity hemispherical standing-wave electric field in the deposition area. Thus, a well-conceived optimization design for the microwave transmission and resonance systems is imperative. This paper introduces a design methodology for MPCVD systems, aligning plasma requirements for diamond growth with the transmission and distribution characteristics of the microwave electromagnetic field, which means that system optimization can be achieved without the need for complex multiple physical fields simulations. The average electric field intensity up to 3.24 × 10<sup>5</sup> V/m is obtained by using the dual-objective optimization function as the comprehensive optimization objective of the metal boundaries of the reactor. Based on simulation findings, an MPCVD system operating at 2450 MHz was designed, resulting in a single-crystal diamond with a high average growth rate of 11.5 μm/h. Further reduction of the microwave frequency to 915 MHz enabled the preparation of a 4-inch polycrystalline diamond film, achieving an average growth rate close to 3.5 μm/h.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"651 ","pages":"Article 128008"},"PeriodicalIF":1.7,"publicationDate":"2024-11-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142719611","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Growth and characterization of n-type Ga2O3 films on sapphire substrates by APMOVPE 利用 APMOVPE 在蓝宝石衬底上生长 n 型 Ga2O3 薄膜并确定其特性
IF 1.7 4区 材料科学 Q3 CRYSTALLOGRAPHY Pub Date : 2024-11-16 DOI: 10.1016/j.jcrysgro.2024.128007
Shun Ukita, Takeyoshi Tajiri, Kazuo Uchida
In this study, n-type Ga2O3 thin films were grown on c-plane sapphire substrates by atmospheric pressure metalorganic vapor phase epitaxy using tetraethoxysilane (TEOS) as the silicon (Si) precursor. X-ray diffraction measurements confirmed that the deposited films were polycrystalline, predominantly consisting of the stable β-phase and the metastable κ-phase. Surface and optical characterizations indicated that lower growth temperature and appropriate Si doping reduce the grain size of three-dimensional Ga2O3 islands, thereby enhancing optical transmittance by mitigating surface scattering. Hall effect measurements demonstrated a maximum electron carrier concentration of approximately 1 × 1017 /cm3 at room temperature, while secondary ion mass spectrometry (SIMS) revealed that Si atomic concentrations were exceeding 1 × 1020 /cm3 in all n-type samples indicating low doping efficiency of Si. Carbon (C) impurities were also measured by SIMS with concentrations as the same order or higher than that of Si, implying they may be one of the reasons for the degraded electrical conductivity and originated from incomplete decomposition of the precursors during low temperature growth. From these results, it is crucial to reduce C impurities and enhance surface flatness to improve electrical and optical properties.
本研究使用四乙氧基硅烷(TEOS)作为硅(Si)前驱体,通过常压金属有机气相外延法在 c 平面蓝宝石衬底上生长了 n 型 Ga2O3 薄膜。X 射线衍射测量证实,沉积的薄膜是多晶体,主要由稳定的 β 相和易变的 κ 相组成。表面和光学特性分析表明,较低的生长温度和适当的硅掺杂可减小三维 Ga2O3 岛的晶粒尺寸,从而通过减少表面散射提高透光率。霍尔效应测量表明,室温下的最大电子载流子浓度约为 1 × 1017 /cm3,而二次离子质谱(SIMS)显示,所有 n 型样品中的硅原子浓度均超过 1 × 1020 /cm3,表明硅的掺杂效率较低。SIMS 还测出碳(C)杂质的浓度与硅的浓度相同或更高,这意味着碳(C)杂质可能是导电性降低的原因之一,源于低温生长过程中前驱体的不完全分解。从这些结果来看,减少 C 杂质和提高表面平整度对于改善电气和光学性能至关重要。
{"title":"Growth and characterization of n-type Ga2O3 films on sapphire substrates by APMOVPE","authors":"Shun Ukita,&nbsp;Takeyoshi Tajiri,&nbsp;Kazuo Uchida","doi":"10.1016/j.jcrysgro.2024.128007","DOIUrl":"10.1016/j.jcrysgro.2024.128007","url":null,"abstract":"<div><div>In this study, n-type Ga<sub>2</sub>O<sub>3</sub> thin films were grown on c-plane sapphire substrates by atmospheric pressure metalorganic vapor phase epitaxy using tetraethoxysilane (TEOS) as the silicon (Si) precursor. X-ray diffraction measurements confirmed that the deposited films were polycrystalline, predominantly consisting of the stable β-phase and the metastable κ-phase. Surface and optical characterizations indicated that lower growth temperature and appropriate Si doping reduce the grain size of three-dimensional Ga<sub>2</sub>O<sub>3</sub> islands, thereby enhancing optical transmittance by mitigating surface scattering. Hall effect measurements demonstrated a maximum electron carrier concentration of approximately 1 × 10<sup>17</sup> /cm<sup>3</sup> at room temperature, while secondary ion mass spectrometry (SIMS) revealed that Si atomic concentrations were exceeding 1 × 10<sup>20</sup> /cm<sup>3</sup> in all n-type samples indicating low doping efficiency of Si. Carbon (C) impurities were also measured by SIMS with concentrations as the same order or higher than that of Si, implying they may be one of the reasons for the degraded electrical conductivity and originated from incomplete decomposition of the precursors during low temperature growth. From these results, it is crucial to reduce C impurities and enhance surface flatness to improve electrical and optical properties.</div></div>","PeriodicalId":353,"journal":{"name":"Journal of Crystal Growth","volume":"650 ","pages":"Article 128007"},"PeriodicalIF":1.7,"publicationDate":"2024-11-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"142703247","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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Journal of Crystal Growth
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