Evidence for molecular tungsten ionic species presence in impurity-seeded hydrogen plasma in contact with W surfaces

IF 2.9 3区 物理与天体物理 Q2 PHYSICS, APPLIED Plasma Processes and Polymers Pub Date : 2024-02-08 DOI:10.1002/ppap.202300227
Silviu Daniel Stoica, Cristina Craciun, Tomy Acsente, Bogdana Mitu, Gheorghe Dinescu
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Abstract

We performed an investigation of tungsten ionic species presence in hydrogen plasmas in contact with a tungsten surface, both in the presence of air impurities and when injected with argon. The study was carried out in a magnetron sputtering system complemented with mass spectrometry diagnostics. Our findings reveal that these plasmas encompass a diverse range of tungsten molecular ionic species in the mass range of 180–250 amu, broadly described as WHxNyOz+ (x = 0–3; y = 0–2; z = 0–3). The validity of these results was further confirmed through dedicated mass spectrometry investigations involving tungsten sputtering discharges in argon–nitrogen and argon–oxygen mixtures.

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与 W 表面接触的不纯种子氢等离子体中存在分子钨离子物种的证据
我们对与钨表面接触的氢等离子体中存在的钨离子物种进行了研究,包括存在空气杂质和注入氩气时。研究在磁控溅射系统中进行,并辅以质谱诊断。我们的研究结果表明,这些等离子体包含质量范围为 180-250 阿姆的各种钨分子离子物种,大致描述为 WHxNyOz+ (x = 0-3;y = 0-2;z = 0-3)。通过在氩-氮和氩-氧混合物中进行钨溅射放电的专门质谱研究,进一步证实了这些结果的正确性。
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来源期刊
Plasma Processes and Polymers
Plasma Processes and Polymers 物理-高分子科学
CiteScore
6.60
自引率
11.40%
发文量
150
审稿时长
3 months
期刊介绍: Plasma Processes & Polymers focuses on the interdisciplinary field of low temperature plasma science, covering both experimental and theoretical aspects of fundamental and applied research in materials science, physics, chemistry and engineering in the area of plasma sources and plasma-based treatments.
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