Rainer Hippler, Martin Cada, Antonin Knizek, Martin Ferus, Zdenek Hubicka
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引用次数: 0
Abstract
A hollow cathode discharge with a CuNi (Cu50Ni50) cathode was operated in an Ar/N\(_2\)/O\(_2\) gas mixture. The energy distribution of plasma ions is investigated with the help of energy-resolved mass spectrometry. Formation of singly ionised Ar\(^+\) and of Cu\(^+\) and Ni\(^+\) ions is observed in pure argon. With the addition of N\(_2\) or O\(_2\) gas the additional formation of molecular N\(_2^ +\) or O\(_2^+\) ions is observed. The intensity of these ions is reduced in the Ar+N\(_2\)+O\(_2\) gas mixture and molecular NO\(^+\) ions become the most abundant ionic species. The formation of neutral NO molecules is confirmed by optical emission spectroscopy. Gas samples collected at the exhaust of the vacuum chamber confirm the formation of NO and, additionally, of NO\(_2\) molecules.
Graphic Abstract
Sample taken from the exhaust of the plasma chamber with a liquid-nitrogen-cooled glass container showing solid nitrogen oxide (blue).
Abstract 在 Ar/N\(_2\)/O\(_2\) 混合气体中进行了铜镍（Cu50Ni50）阴极空心阴极放电。在能量分辨质谱仪的帮助下，对等离子体离子的能量分布进行了研究。在纯氩气中观察到了单离子化的 Ar （^+\）以及 Cu （^+\）和 Ni （^+\）离子的形成。当加入 N （_2）或 O （_2）气体时，会观察到 N （_2^+）或 O （_2^+）分子离子的额外形成。在 Ar+N\(_2\)+O\(_2\) 混合气体中，这些离子的强度降低了，分子 NO\(^+\) 离子成为最丰富的离子种类。光学发射光谱证实了中性 NO 分子的形成。在真空室排气口收集的气体样本证实了 NO 的形成，此外还证实了 NO （_2）分子的形成。
期刊介绍：
Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
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