Pub Date : 2026-03-12DOI: 10.1007/s11090-025-10618-4
Ravikumar Singh, Pushpinder G. Bhatia, R. R. Deshmukh
Pulsed nature of plasma offers an efficient way to control film chemistry during plasma polymerization using very low average power. The pulsed plasma approach helps in introducing and retaining reactive surface functional groups at controlled densities, provides an efficient way of molecular tailoring of surfaces. We have, in the present work, investigated the control of –OH and –COOH groups within plasma-polymerized methacrylic acid (PPMAA) films synthesized using pulsed plasma technique. These groups are very important to attach biomolecules for a variety of applications. We demonstrate that the film chemistry is different for the films deposited at the same duty cycle of the pulse but with different ON and OFF times that influence the deposition rate. These films are characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, surface profilometer, AFM and contact angle measurement. XPS and FTIR studies confirmed incorporation of –OH and –COOH groups onto the film surface. Contact angle results reveal that contact angle decreases from 64º to 41º for 1/15 and 3/90 ms pulse respectively revealing hydrophilic nature of the films. Thickness of the films have been varied from 360Å to 2600Å for CW and 3/30ms pulse respectively, while keeping deposition time 15 min constant. These results illustrate that pulsed plasma polymerization can be effectively utilized to tailor film chemistry for various applications.
{"title":"Controlling Film Chemistry Using Pulsed Plasma Polymerization of Methacrylic Acid Precursor Monomer","authors":"Ravikumar Singh, Pushpinder G. Bhatia, R. R. Deshmukh","doi":"10.1007/s11090-025-10618-4","DOIUrl":"10.1007/s11090-025-10618-4","url":null,"abstract":"<div><p>Pulsed nature of plasma offers an efficient way to control film chemistry during plasma polymerization using very low average power. The pulsed plasma approach helps in introducing and retaining reactive surface functional groups at controlled densities, provides an efficient way of molecular tailoring of surfaces. We have, in the present work, investigated the control of –OH and –COOH groups within plasma-polymerized methacrylic acid (PPMAA) films synthesized using pulsed plasma technique. These groups are very important to attach biomolecules for a variety of applications. We demonstrate that the film chemistry is different for the films deposited at the same duty cycle of the pulse but with different ON and OFF times that influence the deposition rate. These films are characterized by X-ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) spectroscopy, surface profilometer, AFM and contact angle measurement. XPS and FTIR studies confirmed incorporation of –OH and –COOH groups onto the film surface. Contact angle results reveal that contact angle decreases from 64º to 41º for 1/15 and 3/90 ms pulse respectively revealing hydrophilic nature of the films. Thickness of the films have been varied from 360Å to 2600Å for CW and 3/30ms pulse respectively, while keeping deposition time 15 min constant. These results illustrate that pulsed plasma polymerization can be effectively utilized to tailor film chemistry for various applications.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 3","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-03-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147441431","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Pub Date : 2026-03-09DOI: 10.1007/s11090-026-10656-6
Rodrigo Antunes, Arne Meindl, Ante Hecimovic, Ursel Fantz
N(_2)-H(_2) discharges are systematically studied using a coaxial dielectric barrier discharge reactor for ammonia synthesis by means of mass spectrometry, electrical characterization and high-resolution emission spectroscopy. The influence of packing is investigated by accommodating chemically inert SiO(_2) beads in the discharge volume from 920 to 13 mbar. Above 275 mbar, the discharge is dominated by filaments associated with intense microdischarges, whereas at lower pressures, the plasma becomes diffuse and occupies a large volume. In presence of packing, the intensity of the microdischarges at 920 mbar are strongly suppressed, while the electrical and emission properties of the diffuse plasma remain largely unaffected. The absence of intense microdischarges in the diffuse mode at low pressures eliminates important NH(_3) dissociation channels. Decreasing the pressure below 100 mbar leads to a significant increase in [NH(_3)] with SiO(_2) beads. This is attributed to both an increase of E/n, which favours H(_2) and N(_2) dissociation, and consequently to an increase in plasma-surface reactions involving H and N towards ammonia formation. Investigations at 50 mbar reveal that introducing SiO(_2) beads in contact with the plasma has a more limited impact on [NH(_3)] than at 920 mbar. The emission spectra are dominated by the second positive system of N(_2), first negative system of N(_2^+), and H(_{alpha }), with no evidence of excited NH(^*). The rotational temperature of N(_2)(C) is mostly affected by [N(_2)] in [H(_2)] in the empty reactor at 920 mbar, reaching about 808 K at 75 vol.% N(_2). With packing or at 50 mbar the rotational temperature remains at (approx 400,)K. For all tested conditions, the vibrational temperatures of N(_2)(C) lie in the range of (3500-3900,text {K}).
采用质谱、电学表征和高分辨率发射光谱等方法,系统地研究了氨合成用同轴介质阻挡放电反应器中N (_2) -H (_2)的放电情况。通过在920至13mbar的放电体积内容纳化学惰性SiO (_2)微珠,研究了填料的影响。在275毫巴以上,放电主要是与强烈微放电相关的细丝,而在较低的压力下,等离子体变得弥漫性并占据很大的体积。在填料的存在下,920mbar的微放电强度被强烈抑制,而漫射等离子体的电学和发射特性在很大程度上不受影响。在低压下扩散模式中缺乏强烈的微放电消除了重要的NH (_3)解离通道。将压力降低到100毫巴以下,会导致SiO (_2)微球的[NH (_3)]显著增加。这是由于E/n的增加,有利于H (_2)和n (_2)的解离,从而增加了涉及H和n的等离子体表面反应对氨的形成。在50mbar下的研究表明,与920mbar相比,引入与等离子体接触的SiO (_2)微球对[NH (_3)]的影响更有限。发射光谱主要由第二正系统N (_2)、第一负系统N (_2^+)和H (_{alpha })组成,未发现NH (^*)的激发态。在920 mbar空反应器中,[H (_2)]中的[N (_2)]对N (_2) (C)的旋转温度影响最大,在75 vol时可达到808 K左右。% N(_2). With packing or at 50 mbar the rotational temperature remains at (approx 400,)K. For all tested conditions, the vibrational temperatures of N(_2)(C) lie in the range of (3500-3900,text {K}).
{"title":"NH(_3) Synthesis in a Dielectric Barrier Discharge Reactor: A Study from Atmospheric to Low Pressure","authors":"Rodrigo Antunes, Arne Meindl, Ante Hecimovic, Ursel Fantz","doi":"10.1007/s11090-026-10656-6","DOIUrl":"10.1007/s11090-026-10656-6","url":null,"abstract":"<div><p>N<span>(_2)</span>-H<span>(_2)</span> discharges are systematically studied using a coaxial dielectric barrier discharge reactor for ammonia synthesis by means of mass spectrometry, electrical characterization and high-resolution emission spectroscopy. The influence of packing is investigated by accommodating chemically inert SiO<span>(_2)</span> beads in the discharge volume from 920 to 13 mbar. Above 275 mbar, the discharge is dominated by filaments associated with intense microdischarges, whereas at lower pressures, the plasma becomes diffuse and occupies a large volume. In presence of packing, the intensity of the microdischarges at 920 mbar are strongly suppressed, while the electrical and emission properties of the diffuse plasma remain largely unaffected. The absence of intense microdischarges in the diffuse mode at low pressures eliminates important NH<span>(_3)</span> dissociation channels. Decreasing the pressure below 100 mbar leads to a significant increase in [NH<span>(_3)</span>] with SiO<span>(_2)</span> beads. This is attributed to both an increase of <i>E</i>/<i>n</i>, which favours H<span>(_2)</span> and N<span>(_2)</span> dissociation, and consequently to an increase in plasma-surface reactions involving H and N towards ammonia formation. Investigations at 50 mbar reveal that introducing SiO<span>(_2)</span> beads in contact with the plasma has a more limited impact on [NH<span>(_3)</span>] than at 920 mbar. The emission spectra are dominated by the second positive system of N<span>(_2)</span>, first negative system of N<span>(_2^+)</span>, and H<span>(_{alpha })</span>, with no evidence of excited NH<span>(^*)</span>. The rotational temperature of N<span>(_2)</span>(C) is mostly affected by [N<span>(_2)</span>] in [H<span>(_2)</span>] in the empty reactor at 920 mbar, reaching about 808 K at 75 vol.% N<span>(_2)</span>. With packing or at 50 mbar the rotational temperature remains at <span>(approx 400,)</span>K. For all tested conditions, the vibrational temperatures of N<span>(_2)</span>(C) lie in the range of <span>(3500-3900,text {K})</span>.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"46 3","pages":""},"PeriodicalIF":2.5,"publicationDate":"2026-03-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://link.springer.com/content/pdf/10.1007/s11090-026-10656-6.pdf","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"147440916","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}