Optimizing fabrication and performance of liquid-processed carbon nanotube photodetectors on various substrates

Vasileios Lionas, Dimitrios Velessiotis, George Pilatos, Konstantinos Giannakopoulos, Aristotelis Kyriakis, Nikolaos Glezos, Dimitrios Skarlatos
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Abstract

Carbon nanotubes (CNTs) have attracted interest for optoelectronic applications due to their unique electronic and optoelectronic properties. In particular, multiwall (MW) CNTs film acts as perfect photo-collector surface with the possibility to tune the absorbance by controlling the film thickness. In this work, we demonstrate two types of hybrid Si-MWCNTs photodetectors. The MWCNTs are solution-processed and deposited on n-silicon substrate covered by two different dielectrics (Si3N4 or SiO2). The MWCNTs/SiO2/n-Si device is used here as reference, since the SiO2/Si system is the most widely investigated structure in microelectronics. The electrical and optical characteristics of the reference device are compared with the corresponding of our basic MWCNTs/Si3N4/n-Si device. The MWCNTs are deposited on the substrate with the drop casting technique. Optical performance of the SiO2 device is comparable to the Si3N4 device thus revealing a quite interesting response under UV illumination. The Si3N4 device exhibited a peak equivalent quantum efficiency (EQE) of 57% at 3 μW of source illumination power, thus demonstrating a superior performance as compared to the SiO2 device (EQE of up to 55%, which is also promising for future applications). This performance can be attributed to the great absorption in UV region of CNTs layer. Apart from this technological goal, we also investigated how MWCNTs/Si3N4 or MWCNTs/SiO2 heterojunctions perform using standard electrical characterization techniques and how the presence of the CNTs change the dielectric characteristics of both substrates.

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优化各种基底上的液体加工碳纳米管光电探测器的制造和性能
碳纳米管(CNT)因其独特的电子和光电特性,在光电应用领域备受关注。特别是,多壁(MW)碳纳米管薄膜可作为完美的光收集表面,并可通过控制薄膜厚度来调节吸收率。在这项工作中,我们展示了两种类型的混合 Si-MWCNTs 光电探测器。MWCNT 经溶液处理后沉积在由两种不同电介质(Si3N4 或 SiO2)覆盖的正硅基底上。这里使用 MWCNTs/SiO2/n-Si 器件作为参考,因为 SiO2/Si 系统是微电子学中研究最广泛的结构。参考器件的电气和光学特性与我们的基本 MWCNTs/Si3N4/n-Si 器件的相应特性进行了比较。MWCNT 采用滴铸技术沉积在基底上。SiO2 器件的光学性能与 Si3N4 器件相当,因此在紫外线照射下显示出相当有趣的响应。在 3μW 光源照明功率下,Si3N4 器件的峰值等效量子效率(EQE)为 57%,因此与 SiO2 器件(EQE 高达 55%,未来应用前景广阔)相比,Si3N4 器件的性能更为优越。这一性能可归功于碳纳米管层在紫外线区域的高吸收率。除了这一技术目标,我们还使用标准电学表征技术研究了 MWCNTs/Si3N4 或 MWCNTs/SiO2 异质结的性能,以及 CNTs 的存在如何改变这两种基底的介电特性。本文受版权保护。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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