Preparation of Nano-silica and Nano-silicone

Abdulrazzaq Hammal
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Abstract

In this research, silica and silicon were prepared using glass waste. The preparation process consisted of several stages that started with the collection of crushed glass samples, treating them physically (grinding and granular sorting) and mixing granulated crushed glass with NaOH at ratios of 1:1, 1:2 and 1:3. In a laboratory furnace, treatment at different temperatures (800, 900 and 1000 °C) was performed. Then, the sample was treated with diluted HCl (1:1) with heating to 60 °C to isolate the silica; after that, it was treated at 900 °C for 30 min to form SiO2 nanoparticles with a yield of 68% and a purity of up to 99.5%. The resulting silica (SiO2) was characterised by XRD and AFM techniques. Results from the two- and three-dimensional images captured by AFM showed the formation of silica nanotubes with a surface roughness (Ra) of 78 nm. Silicon nanoparticles were prepared from silica by mixing it with magnesium at a ratio of 1:2. The mixture was then treated at different temperatures (700, 750, 800 and 900 °C), treated with HCl, treated with HF to get rid of the secondary compounds and heated to 800 °C to obtain silicon with a yield of 90%. Analysis using XRD and AFM techniques proved the formation of silicon nanostructure with an Ra of 286 nm. KEYWORDS glass, industrial waste, magnesiothermic reduction, nanotechnology, silica, silicon
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制备纳米二氧化硅和纳米硅酮
这项研究利用玻璃废料制备二氧化硅和硅。制备过程分为几个阶段,首先是收集碎玻璃样品,对其进行物理处理(研磨和颗粒分类),然后将颗粒状碎玻璃与 NaOH 按 1:1、1:2 和 1:3 的比例混合。在实验室熔炉中进行不同温度(800、900 和 1000 °C)的处理。然后,用稀盐酸(1:1)处理样品,加热至 60 °C,分离出二氧化硅;之后,在 900 °C下处理 30 分钟,形成二氧化硅纳米颗粒,产率为 68%,纯度高达 99.5%。所得二氧化硅(SiO2)采用 XRD 和原子力显微镜技术进行表征。原子力显微镜捕捉到的二维和三维图像结果显示,形成的二氧化硅纳米管表面粗糙度(Ra)为 78 nm。将二氧化硅与镁以 1:2 的比例混合,制备出纳米硅颗粒。然后在不同温度(700、750、800 和 900 ℃)下处理混合物,用盐酸处理,用氢氟酸处理以除去次生化合物,再加热到 800 ℃,得到硅,产率为 90%。利用 XRD 和原子力显微镜技术进行的分析表明,形成了 Ra 值为 286 nm 的硅纳米结构。
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