Deep-ultraviolet LEDs with an Al-graded p-AlGaN layer exhibiting high wall-plug efficiency and high modulation bandwidth simultaneously

IF 1.9 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Semiconductor Science and Technology Pub Date : 2024-02-16 DOI:10.1088/1361-6641/ad238b
Bingyue Cui, Jie Yang, Xingfa Gao, Jiaheng He, Zhe Liu, Zhe Cheng, Yun Zhang
{"title":"Deep-ultraviolet LEDs with an Al-graded p-AlGaN layer exhibiting high wall-plug efficiency and high modulation bandwidth simultaneously","authors":"Bingyue Cui, Jie Yang, Xingfa Gao, Jiaheng He, Zhe Liu, Zhe Cheng, Yun Zhang","doi":"10.1088/1361-6641/ad238b","DOIUrl":null,"url":null,"abstract":"This work demonstrated a deep-ultraviolet (DUV) LED with an Al-graded p-AlGaN contact layer above the electron blocking layer to alleviate p-type contact resistance, the asymmetry of carriers transport, and the polarization effect. The fitting results from the ABC + f(n) model revealed that the LED has a higher radiative recombination coefficient than the conventional structures ever reported, which contributes to a lower carrier lifetime. The light output power of the LED at 350 mA is 44.71 mW, the peak external quantum efficiency (EQE) at 22.5 mA is 5.12%, the wall-plug efficiency at 9 mA is 4.40%. The 3 dB electrical-to-optical modulation bandwidth of the graded p-AlGaN contact layer LED is 390 MHz after impedance matching. In short, this study provides an in-depth analysis of the physical mechanism of the enhanced EQE and decreased carrier lifetime of DUV LEDs with Al-graded AlGaN as a p-type contact layer.","PeriodicalId":21585,"journal":{"name":"Semiconductor Science and Technology","volume":"25 1","pages":""},"PeriodicalIF":1.9000,"publicationDate":"2024-02-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Semiconductor Science and Technology","FirstCategoryId":"5","ListUrlMain":"https://doi.org/10.1088/1361-6641/ad238b","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

This work demonstrated a deep-ultraviolet (DUV) LED with an Al-graded p-AlGaN contact layer above the electron blocking layer to alleviate p-type contact resistance, the asymmetry of carriers transport, and the polarization effect. The fitting results from the ABC + f(n) model revealed that the LED has a higher radiative recombination coefficient than the conventional structures ever reported, which contributes to a lower carrier lifetime. The light output power of the LED at 350 mA is 44.71 mW, the peak external quantum efficiency (EQE) at 22.5 mA is 5.12%, the wall-plug efficiency at 9 mA is 4.40%. The 3 dB electrical-to-optical modulation bandwidth of the graded p-AlGaN contact layer LED is 390 MHz after impedance matching. In short, this study provides an in-depth analysis of the physical mechanism of the enhanced EQE and decreased carrier lifetime of DUV LEDs with Al-graded AlGaN as a p-type contact layer.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
同时具有高壁插效率和高调制带宽的铝梯度对铝镓氮层深紫外发光二极管
这项研究展示了一种深紫外(DUV)发光二极管,该发光二极管在电子阻挡层上方采用了铝级p-AlGaN接触层,以减轻p型接触电阻、载流子传输的不对称性和极化效应。ABC + f(n) 模型的拟合结果表明,该 LED 的辐射重组系数比以往报道的传统结构更高,从而导致载流子寿命更短。该 LED 在 350 mA 时的光输出功率为 44.71 mW,22.5 mA 时的峰值外部量子效率 (EQE) 为 5.12%,9 mA 时的壁插效率为 4.40%。阻抗匹配后,渐变 pAlGaN 接触层 LED 的 3 dB 电-光调制带宽为 390 MHz。总之,本研究深入分析了采用铝分级 AlGaN 作为 p 型接触层的 DUV LED 的 EQE 增强和载流子寿命降低的物理机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Semiconductor Science and Technology
Semiconductor Science and Technology 工程技术-材料科学:综合
CiteScore
4.30
自引率
5.30%
发文量
216
审稿时长
2.4 months
期刊介绍: Devoted to semiconductor research, Semiconductor Science and Technology''s multidisciplinary approach reflects the far-reaching nature of this topic. The scope of the journal covers fundamental and applied experimental and theoretical studies of the properties of non-organic, organic and oxide semiconductors, their interfaces and devices, including: fundamental properties materials and nanostructures devices and applications fabrication and processing new analytical techniques simulation emerging fields: materials and devices for quantum technologies hybrid structures and devices 2D and topological materials metamaterials semiconductors for energy flexible electronics.
期刊最新文献
Effect of atomic layer deposition process parameters on TiN electrode for Hf0.5Zr0.5O2 ferroelectric capacitor The ab initio study of n-type nitrogen and gallium co-doped diamond Self-powered Schottky barrier photodetector with high responsivity based on homoepitaxial Ga2O3 films by MOCVD Sub-bandgap excited photoluminescence probing of deep defect complexes in GaN doped by Si, Ge and C impurities The effect of temperature on the electrical characteristics of zigzag and armchair black phosphorus based 2D MOSFET
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1