Jun Chen, Lunzhe Wu, Lin Wang, Chen Hu, Chaoyang Wei, Jianda Shao
{"title":"Research on a Compensation Correction Algorithm for the Removal Function of Atmospheric-Pressure Plasma Processing","authors":"Jun Chen, Lunzhe Wu, Lin Wang, Chen Hu, Chaoyang Wei, Jianda Shao","doi":"10.1007/s11090-024-10456-w","DOIUrl":null,"url":null,"abstract":"<div><p>Atmospheric-pressure plasma processing (APPP) is an important method for the fabrication of high-precision optics because it involves highly efficient and nondamaging material removal based on its pure chemical etching mechanism. However, owing to the heat accumulation phenomenon caused by the jet heat flux, the nonlinearity of the material removal rate in APPP is inevitable, making it difficult to achieve deterministic optical surfacing. To bridge this gap, this study focused on analyzing the nonlinear relationship between the material removal rate and heat accumulation. The simulation results indicated that when the sliding distance increased from 10 to 50 mm, the surface temperature of the workpiece increased from 387.3 to 419.5 K, an increase of more than 8%. When the dwell time increased from 0.33 to 2 s, the surface temperature of the workpiece increased from 348.1 to 419.5 K (including the effect of sliding distance), an increase of more than 21%. A novel algorithm that simultaneously considers dwell time and sliding distance was proposed based on the results. A threshold parameter <i>t</i><sub><i>q</i></sub> was introduced to determine whether to correct the deviation caused by the sliding distance. With the proposed algorithm, the matching residual surface root-mean-square (RMS) error decreased from 97.5 to 39.6 nm. The RMS deviation error of the matching residual surface error converged from 11.6 to 4.7% after surface-figuring experiments. The proposed algorithm is expected to provide a promising solution for future deterministic optical surfacing.</p></div>","PeriodicalId":734,"journal":{"name":"Plasma Chemistry and Plasma Processing","volume":"44 2","pages":"927 - 943"},"PeriodicalIF":2.6000,"publicationDate":"2024-02-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasma Chemistry and Plasma Processing","FirstCategoryId":"5","ListUrlMain":"https://link.springer.com/article/10.1007/s11090-024-10456-w","RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, CHEMICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Atmospheric-pressure plasma processing (APPP) is an important method for the fabrication of high-precision optics because it involves highly efficient and nondamaging material removal based on its pure chemical etching mechanism. However, owing to the heat accumulation phenomenon caused by the jet heat flux, the nonlinearity of the material removal rate in APPP is inevitable, making it difficult to achieve deterministic optical surfacing. To bridge this gap, this study focused on analyzing the nonlinear relationship between the material removal rate and heat accumulation. The simulation results indicated that when the sliding distance increased from 10 to 50 mm, the surface temperature of the workpiece increased from 387.3 to 419.5 K, an increase of more than 8%. When the dwell time increased from 0.33 to 2 s, the surface temperature of the workpiece increased from 348.1 to 419.5 K (including the effect of sliding distance), an increase of more than 21%. A novel algorithm that simultaneously considers dwell time and sliding distance was proposed based on the results. A threshold parameter tq was introduced to determine whether to correct the deviation caused by the sliding distance. With the proposed algorithm, the matching residual surface root-mean-square (RMS) error decreased from 97.5 to 39.6 nm. The RMS deviation error of the matching residual surface error converged from 11.6 to 4.7% after surface-figuring experiments. The proposed algorithm is expected to provide a promising solution for future deterministic optical surfacing.
期刊介绍：
Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
