Electrical properties and band alignments of Sb2Te3/Si heterojunctions, low-barrier Sb2Te3/n-Si and high-barrier Sb2Te3/p-Si junctions

IF 2.3 4区 物理与天体物理 Q3 PHYSICS, APPLIED Applied Physics Express Pub Date : 2024-03-08 DOI:10.35848/1882-0786/ad2d75
Naoya Okada, Wen Hsin Chang, Shogo Hatayama, Yuta Saito and Toshifumi Irisawa
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Abstract

We investigated the electrical junction properties of the layered Sb2Te3 film formed on Si substrates. The current−voltage characteristics of the Sb2Te3/n-Si heterojunction showed an ohmic properties, whereas the Sb2Te3/p-Si heterojunction exhibited rectifying properties with a high barrier height of 0.77 eV. The capacitance−voltage characteristics of MOS capacitors with the Sb2Te3 electrode indicated an effective work function of 4.44 eV for the Sb2Te3 film. These findings suggest that the Sb2Te3/Si heterostructure possesses a low conduction band offset, as inferred from the temperature dependence of the current−voltage characteristics of the Sb2Te3/n-Si.
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Sb2Te3/Si 异质结、低势垒 Sb2Te3/n-Si 和高势垒 Sb2Te3/p-Si 结的电学特性和能带排列
我们研究了在硅衬底上形成的层状 Sb2Te3 薄膜的电结特性。Sb2Te3/n-Si 异质结的电流-电压特性显示出欧姆特性,而 Sb2Te3/p-Si 异质结则显示出整流特性,具有 0.77 eV 的高势垒高度。带有 Sb2Te3 电极的 MOS 电容器的电容-电压特性表明,Sb2Te3 薄膜的有效功函数为 4.44 eV。从 Sb2Te3/n-Si 电流-电压特性的温度依赖性推断,这些发现表明 Sb2Te3/Si 异质结构具有较低的导带偏移。
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来源期刊
Applied Physics Express
Applied Physics Express 物理-物理:应用
CiteScore
4.80
自引率
8.70%
发文量
310
审稿时长
1.2 months
期刊介绍: Applied Physics Express (APEX) is a letters journal devoted solely to rapid dissemination of up-to-date and concise reports on new findings in applied physics. The motto of APEX is high scientific quality and prompt publication. APEX is a sister journal of the Japanese Journal of Applied Physics (JJAP) and is published by IOP Publishing Ltd on behalf of the Japan Society of Applied Physics (JSAP).
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