Simulation Study of Interfacial Switching Memristor Structure and Neural Network Performance

IF 1.1 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Korean Journal of Metals and Materials Pub Date : 2024-03-05 DOI:10.3365/kjmm.2024.62.3.212
Yun Hyeok Song, Ji Min Lim, Sagar S. Khot, Dongmyung Jung, Yongwoo Kwon
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Abstract

In this study, the architecture of an interfacial switching memristor, which has a metal-insulatormetal structure of Pt/SrTiO3/Nb-SrTiO3 was investigated. The performance of a neural network that uses memristors as its synapse components was also examined with system-level simulations. A finite element solver, COMSOL Multiphysics, was used to simulate synaptic device characteristics, specifically, the conductance change, using a series of pulses for a given architecture. An open-source software, NeuroSim, was used to simulate the ability of the neural network to recognize and identify handwritten digits. Electrostatics, mass transport, and thermionic emission equations were numerically solved in a fully coupled manner to model the Schottky barrier height modulation at the Pt/SrTiO3 contact using the applied bias. The barrier height is a function of the oxygen vacancy concentration in the SrTiO3 near the contact. The gradual change of the oxygen vacancy concentration profile caused by successive pulses results in the gradual change of conductance. Utilizing the simulations, the influences of device structure modification, and more specifically, changing the size of the Schottky contact, on long-term potentiation and depression were analyzed for planar devices. The results show that a smaller Schottky contact yields a higher digit recognition rate. Based on this finding, a three-dimensional device architecture that is vertically stackable was designed.
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界面开关型 Memristor 结构与神经网络性能的仿真研究
在这项研究中,我们研究了一种界面开关忆阻器的结构,这种忆阻器具有 Pt/SrTiO3/Nb-SrTiO3 的金属嵌层金属结构。此外,还通过系统级仿真检验了使用忆阻器作为突触元件的神经网络的性能。研究人员使用有限元求解器 COMSOL Multiphysics 来模拟突触设备的特性,特别是特定结构下一系列脉冲的电导变化。使用开源软件 NeuroSim 模拟神经网络识别和辨认手写数字的能力。以完全耦合的方式对静电、质量传输和热离子发射方程进行了数值求解,从而利用外加偏压对 Pt/SrTiO3 接触处的肖特基势垒高度调制进行建模。势垒高度是接触附近 SrTiO3 中氧空位浓度的函数。连续脉冲引起的氧空位浓度曲线的渐变导致了电导率的渐变。利用模拟,分析了平面器件结构改变(更具体地说,改变肖特基触点的大小)对长期电位和抑制的影响。结果表明,肖特基触点越小,数字识别率越高。基于这一发现,我们设计了一种可垂直堆叠的三维器件结构。
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来源期刊
Korean Journal of Metals and Materials
Korean Journal of Metals and Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-METALLURGY & METALLURGICAL ENGINEERING
CiteScore
1.80
自引率
58.30%
发文量
100
审稿时长
4-8 weeks
期刊介绍: The Korean Journal of Metals and Materials is a representative Korean-language journal of the Korean Institute of Metals and Materials (KIM); it publishes domestic and foreign academic papers related to metals and materials, in abroad range of fields from metals and materials to nano-materials, biomaterials, functional materials, energy materials, and new materials, and its official ISO designation is Korean J. Met. Mater.
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